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1)  Short channel MOST
短沟道MOST
1.
This paper discussed the electrical characteristic of short channel MOST at very high temperature.
本文以短沟道MOST电学参数的温度特性为研究对象,对高温短沟道MOST的电学特性进行了深入的探讨。
2)  short-channel
短沟道
1.
Threshold voltage in short-channel SOI BJMOSFET;
短沟道SOI BJMOSFET的阈值电压
2.
Through solving possion equation, the characteristics of short-channel MOSFET device is analyzed in details in the following three aspects: the effect of channel length modulation , the change of threshold voltage and potential barrier decrease between source and channel.
通过求解泊松方程,从沟道长度调制效应、阈值电压变化及源极同沟道间的势垒变化三个方面详细分析了短沟道MOSFET的器件特性。
3.
A threshold voltage model for short-channel MOSFET is developed by solving a 2-D Possion s equation.
通过求解二维泊松方程推导了一个简洁的短沟道 MOS的阈值电压模型 ,得到的 DIBL因子可用于分析参数对短沟道效应的影响。
3)  Short-channel MOSFET
短沟道MOSFET
4)  short channel effect
短沟道效应
1.
The model includes the substrate bias effect, the short channel effect and the relation between these two effects.
它综合考虑了衬偏效应、短沟道效应以及两者之间的关系。
2.
Based on the hydrodynamic energy transport model, the short channel effect immunity in the deep sub micron grooved gate PMOSFET is studied together with the influences of substrate and channel doping density on that effect immunity.
基于流体动力学能量输运模型 ,首先研究了槽栅器件对短沟道效应的抑制作用 ,接着研究了不同衬底和沟道杂质浓度的深亚微米槽栅PMOSFET对短沟道效应抑制的影响 ,同时与相应平面器件的特性进行了对比 。
3.
I V characteristics and sub threshold characteristics,as well as the short channel effect(SCE) are carefully investigated.
研究了 FINFET的 I- V特性、亚阈值特性、短沟道效应等 。
5)  Short-channel effect
短沟道效应
1.
Computer simulation analysis of short-channel effects and corner effectsfor deep sub-micron triple-gate FinFETs
深亚微米三栅FinFET短沟道效应和拐角效应计算机模拟分析
2.
A new kind of sub-50 nm N channel double gate MOS nanotransistors was simulated by solving coupling Poisson-Schrdinger equations in a self-consistent way with a finite element method,and a systematic simulation-based study was presented on the short-channel effects.
采用有限元法自洽求解泊松-薛定谔方程,数值模拟了一种新型的亚50nm N沟道双栅MOS场效应晶体管的电学特性,系统阐述了尺寸参数对短沟道效应的影响规律。
3.
In this paper the methodology of modeling and characterization of modern MOSFET ,with emphasis on short-channel effects of deep-submicorns devices up to 0.
本文基于BSIM标准研究了现代深亚微米级MOSFET器件的建模和特征提取方法 ,着重在于短沟道效应方面 ,其中测试样品由MicronTM公司提供 ,最短沟道长度仅为 0 16微米 。
6)  short channel effects
短沟道效应
补充资料:短沟道效应(shortchanneleffect)
短沟道效应(shortchanneleffect)

当金属-氧化物-半导体场效应晶体管(MOSFET)的沟道长度L缩短到可与源和漏耗尽层宽度之和(WS WD)相比拟时,器件将发生偏离长沟道(也即L远大于WS WD)的行为,这种因沟道长度缩短而发生的对器件特性的影响,通常称为短沟道效应。由于短沟道效应使MOSFET的性能变坏且工作复杂化,所以人们希望消除或减小这个效应,力图实现在物理上是短沟道的器件,而在电学上仍有长沟道器件的特性。

说明:补充资料仅用于学习参考,请勿用于其它任何用途。
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