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1)  Annealing characteristic
热退火特性
2)  anneal characteristic
退火特性
1.
Their optical characteristic and anneal characteristic are described briefly in this paper.
介绍了长、短周期光纤光栅的光学特性及退火特
2.
This article briefly describes the anneal characteristic of hydrogen loaded optical fiber and B/Ge optical fiber.
获得性能稳定的光纤光栅具有重要的意义 ,文章介绍了氢载光纤、B/Ge光纤两种光敏光纤的退火特性。
3)  thermal annealing
热退火
1.
Investigation of thermal annealing for a-C:F:H filmsdeposited with microwave ECR-CVD method;
ECR-CVD法制备的a-C:F:H薄膜在N_2气氛中的热退火研究
2.
Study of diffusion energy of strain quantum well with thermal annealing
热退火中应变量子阱的扩散激活能的研究
3.
The different dose of rare earth Nd ion was implanted into n-type silicon, and the samples were annealed by using rapid thermal annealing method.
本文采用高能离子注入技术将两种剂量的稀土元素钕(Nd)引入外延n-Si片中,并借助非相干光快速热退火(RTA)方法使注入层再结晶并电激活;利用深能级瞬态谱(DLTS)测量方法对Si中Nd离子的深能级行为进行了研究。
4)  annealing [英][ə'ni:liŋ]  [美][ə'nilɪŋ]
加热退火
5)  Annealing [英][ə'ni:liŋ]  [美][ə'nilɪŋ]
热退火
1.
Thermal Annealing on Scatter Particles in KDP Crystal;
热退火对KDP晶体中散射颗粒的影响
2.
From the PL results,UV intensity of the sample annealed at 700℃ increases highly comparing with that of unannealed,while it decreases slightly at higher annealing temperature(900℃);the luminescence of visible.
分别用SEM、XRD观察了样品在沉积态(300℃)及700℃和900℃下热退火后的形貌和结构。
3.
The influence of thermal annealing on the electron field emission characteristics of the AIN coating on Si substrate was investigated.
以氮气为反应气体;用射频反应溅射方法制备了AIN薄膜,结合XPS和XRD表征考察了热退火后处理对样品场电子发射性能的影响。
6)  annealing heating
退火加热
1.
Study on new annealing heating process of large forging of D2 steel;
D2钢大锻件退火加热新工艺设计及研究
补充资料:软化退火(见低温退火)


软化退火(见低温退火)
soft-annealing

rU0nhUO tUihUO软化退火(soft一annealing)见低温退火。
说明:补充资料仅用于学习参考,请勿用于其它任何用途。
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