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1)  thin film of solid dielectric
固态介质薄膜
2)  Dielectric film
介质薄膜
1.
In this paper, a theoretical model of long-pulse laser leading to thermal stress damageof dielectric film in film/substrate systems is developed.
本文用有限元法研究并建立了长脉冲激光对介质薄膜热应力损伤的理论模型,在该模型的基础上模拟了介质薄膜和基底中的温度场和热应力场瞬态分布,分析了长脉冲激光对介质薄膜的热应力损伤的机理。
2.
The damage mechanisms and characteristics of dielectric films under the irradiation of the long pulse laser are studied in this paper.
本文从理论和实验方面研究了长脉冲激光对介质薄膜的损伤机理和特性,并对波长为1064nm的长脉冲激光产生的损伤阈值进行了测试研究。
3)  dielectric thin films
介质薄膜
4)  medium film
介质薄膜
1.
A layer of medium film is plated on the surface of such devices (called film of increasing transmission or FIT) in order to reduce the loss of surface reflection.
在光学器件中,由于器件(如透镜、棱镜)表面的反射作用而使光能损失,为了减少光学器件表面的反射损失,常在器件表面镀上一层透明介质薄膜(称为增透膜),增透膜的效果与介质薄膜的折射率、厚度等相联系。
5)  dielectric thin film
介质薄膜
1.
There are many kinds of the modern dielectric thin films in common use, which are classified according to their compositions as three:inorganic,organic and combined.
介质薄膜是一类重要的电子薄膜。
2.
To understand thermodynamically the influence of spheroidal impurities on the laser damage of optical thin film,FEM was used to simulate how the thermal absorption of spheroidal impurities affects the temperature field distribution in a 500nm-thick dielectric thin film under laser irradiation,based on the heat transfer equations.
在介质薄膜中,薄膜中的嵌入杂质或缺陷是导致薄膜激光损伤的关键因素。
6)  thin dielectric film
薄介质膜
1.
Experimental study of breakdown characteristic of thin dielectric film in nanometre range formed by low temperature PECVD;
PECVD法低温形成纳米级薄介质膜击穿特性的实验研究
补充资料:二氧化硅薄膜介质材料
分子式:SiO2
CAS号:

性质:一种高纯氧化膜。具有介电性能稳定、耐潮性好、电容温度系数小和介质损耗角正切值小等优点。介电常数3.67~5.90,tgδ<2×10-4,击穿电压大于50V。采用电子束蒸发法、射频溅射法、热氧化法等制取,主要用于制作半导体混合集成电路和薄膜集成电路的MOS电容器和隔离绝缘层等。

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