1) measuring and controlling thin film thickness
膜厚测控
2) thickness monitoring
膜厚监控
1.
The progress of optical thin film thickness monitoring;
光学薄膜膜厚监控方法及其进展
3) film-thickness monitoring
膜厚监控
1.
The system stracture,coating parameters and results of the optical interference filters,using quartz crystal film-thickness monitoring and deposition controller,had been introduced in this paper.
讨论了通过改进离子辅助镀膜工艺提高T iO2薄膜折射率稳定性对于应用石英晶体膜厚监控技术的重要性。
4) film thickness monitoring
膜厚监控
1.
Study on optical film thickness monitoring system by wideband spectrum based on LabVIEW;
基于LabVIEW的宽光谱膜厚监控系统的研制
2.
Determination of the film refractive index in realtime monitoring for wideband thin-film thickness monitoring;
为此,采用最小二乘法拟合,即在整个宽光谱范围内采集每个波长点的信息,所得结果误差很小,一般都在2%~5%之间,有时可达到10%,在很大程度上提高了实际镀膜时膜厚监控的精度。
5) thickness measurement
膜厚测量
1.
Analyzes in detail the principle of thickness measurement of metallic waveguide iris by means of the electromagnetic field theory.
运用电磁场理论对金属波导膜厚测量的原理进行了详细分析,并且研制了一台膜厚测量仪,理论和实践表明:可以通过测量复合金属波导膜系励磁电流的脉冲波形来控制薄膜的生长厚度。
6) determining of thin film thickness
膜厚测定
