1) near field photolithography
近场光刻
1.
Super RENS technology has been applied in super high density optical data storage, near field photolithography, nanome.
具有多层纳米薄膜结构的超分辨近场结构 (Super RENS)的提出改变了这种局面 ,并在诸如超高密度光学数据存储、近场光刻技术、纳米光子学晶体管等领域获得了重要的应用。
2) near-field optica l field
近场光场
3) proximity lithography
接近式光刻
1.
Computer simulation of diffraction intensity in proximity lithography;
接近式光刻衍射光场的快速计算机模拟
2.
The light density on the wafer mainly depends on the diffraction produced by the gap between the mask and the wafer in proximity lithography.
在接近式光刻中,衬底上的光强分布主要是受掩模与衬底间的间隙引起的衍射影响。
4) Proximity Aligners
近式光刻机
5) near-field optics
近场光学
1.
Optical properties of photonic crystals and measurement & characterization by near-field optics;
光子晶体的光学特性与近场光学测量表征
2.
The Time-domain Methods for Numerical Electromagnetic Calculations of Near-field Optics;
近场光学电磁场数值计算中的时域方法
3.
The Simulation of Different Kinds Imaging in the Near-field Optics;
近场光学不同成像方式的数值模拟
6) near field fluorescence
近场荧光
1.
confocal fluorescence, multi photon excitation, total internal reflection fluorescence and near field fluorescence, are reviewed with 64 references.
系统地综述了构成该技术的共焦荧光法、全内反射荧光法、多光子荧光法以及近场荧光法等 4种方法的原理、特点、发展及其应用 ,并且强调了其在单分子测定中的作用。
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