1) diamond-carbon films
金刚石-碳膜
2) diamond-like carbon films
类金刚石碳膜
1.
Properties of diamond-like carbon films deposited by unbalanced magnetron sputtering;
非平衡磁控溅射类金刚石碳膜的性能
2.
The deposition of diamond-like carbon films produced by radio frequency glow discharge of hydrocarbon gas was studied,and the effects of radio frequency voltage and deposition time on the thickness and the Vickers microhardness of films were investigated.
研究了碳氢气体通过射频辉光放电沉积类金刚石碳膜。
4) diamond-like carbon(DLC) film
类金刚石碳(DLC)膜
5) diamond-like carbon
类金刚石碳膜
1.
Characteristics and application of diamond-like carbon films by PECVD;
等离子体化学气相沉积类金刚石碳膜的特性及应用
2.
A diamond-like carbon (DLC) film is deposited as an electron injection layer between the polymer light-emitting layer(MEH-PPV) and aluminum (Al) cathode electrode in polymer electroluminescence devices (PLEDs) using a radio frequency plasma deposition system.
用正丁胺作碳源,采用射频辉光等离子系统制备类金刚石碳膜(DLC),沉积在聚合物发光器件中的发光层(MEH-PPV)和铝(Al)阴极间作电子注入层。
3.
In this article we successfully synthesized diamond-like carbon (DLC) films on the stainless steel and glass using CH_4, H_2 as source gases and argon as diluent gas by radio frequency plasma enhanced chemical vapor deposition (rf PECVD) process.
本论文探讨了利用射频等离子体增强化学气相沉积(rf PECVD)技术以CH_4、H_2为气源，Ar为稀释气体，在不锈钢、玻璃等基底上制备大面积类金刚石碳膜(Diamond-like Carbon，简称DLC)。
6) DLC film
类金刚石碳薄膜
1.
The friction and wear behaviors of the DLC film sliding against Al_2O_3 ball or GCr15 steel ball under dry- and water-lubricated conditions were evaluated using a U.
利用射频-直流等离子体增强化学气相沉积技术在单晶硅衬底上沉积类金刚石碳薄膜,采用激光拉曼光谱仪和原子力显微镜对薄膜的结构和表面形貌进行表征,采用纳米压痕仪测定薄膜的硬度,并用UMT型微摩擦磨损试验机考察了薄膜在不同试验条件下的摩擦磨损性能。
2.
The microstructure and morphology of the DLC film were investigated by means of Raman spectroscopy, X-ray photoelectron spectroscopy, infrared spectrometry, and atomic force microscopy.
利用直流射频等离子增强化学气相沉积技术在单晶硅表面制备了类金刚石碳薄膜。
3.
The microstructure and morphology of the DLC film were investigated by means of X-ray photoelectron spectroscopy and atomic force microscopy.
利用磁控溅射技术在 p(100)型单晶硅表面制备了 Ti、Al 掺杂类金刚石碳薄膜。
补充资料：金刚石膜
分子式：
CAS号：
性质：用低压或常压化学气相沉积(CVD)方法人工合成的金刚石膜。金刚石的硬度在固体材料中最高，达HV100GPa，热导率为100W·cm-l·K-1，为铜的5倍，禁带宽度为6.6～8.0eV，室温电阻率高达1016Ω·cm，通过掺杂可以形成半导体材料。金刚石在从紫外到红外广阔频带里都有很高的光学透射率，它还是一种优良耐腐蚀材料。金刚石膜的制备方法有热化学气相沉积(TCVD)和等离子体化学气相沉积(PCVD)两大类。现正在研究将研制得到的金刚石膜作耐磨涂层、声学膜片、光学窗口、集成电路高热导基片。还研究在硅片上外延单晶金刚石膜，以制备金刚石器件。
CAS号：
性质：用低压或常压化学气相沉积(CVD)方法人工合成的金刚石膜。金刚石的硬度在固体材料中最高，达HV100GPa，热导率为100W·cm-l·K-1，为铜的5倍，禁带宽度为6.6～8.0eV，室温电阻率高达1016Ω·cm，通过掺杂可以形成半导体材料。金刚石在从紫外到红外广阔频带里都有很高的光学透射率，它还是一种优良耐腐蚀材料。金刚石膜的制备方法有热化学气相沉积(TCVD)和等离子体化学气相沉积(PCVD)两大类。现正在研究将研制得到的金刚石膜作耐磨涂层、声学膜片、光学窗口、集成电路高热导基片。还研究在硅片上外延单晶金刚石膜，以制备金刚石器件。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条