1) Lithography equipment
光刻设备
1.
In this paper the principle ,construction and the mechanics generated by double frequency of the laser double-frequency interferometer were analysed , then the actual application of the laser double-frequency interferometer in Lithography equipment was formulated.
通过对双频激光干涉仪的原理、结构、双频产生机理进行分析,阐述激光干涉仪在光刻设备中的实际应用,探讨激光干涉仪技术。
2) Lithography equipment market
光刻设备市场
3) etching equipment
刻蚀设备
1.
Now etching has be-come the standard technology,and etching equipment is the key equipment in IC production.
目前,刻蚀技术已经成为集成电路生产中的标准技术,干法刻蚀设备亦成为关键设备。
4) Etch Equipment
蚀刻设备
5) photoetching figure design
光刻版设计
6) Plasma etching apparatus
等离子刻蚀设备
补充资料：净化设备——混凝设备
净化设备——混凝设备    | |
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说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条