1) ion assisted deposition
离子辅助沉积
1.
Analysis of stress in TiO_2 thin film prepared with ion assisted deposition;
离子辅助沉积对TiO_2薄膜应力的影响
2.
Study on performance of Nb_2O_5 films with ion assisted deposition;
离子辅助沉积对Nb_2O_5薄膜特性的影响
3.
Frequency doubling antireflection coatings at 946nm and 473nm were deposited for LiB_3O_5 crystal with ion assisted deposition.
采用离子辅助沉积技术在L iB3O5晶体上制备了946nm,473nm倍频增透膜,并测量了薄膜的性质。
4) ion beam assisted deposition(IBAD)
离子束辅助沉积
1.
The microstructure and morphology of the lead telluride optical thin films prepared by ion beam assisted deposition(IBAD) were observed by atomic force microscopy(AFM).
利用原子力显微镜(AFM)研究了离子束辅助沉积碲化铅(PbTe)薄膜的微观结构和表面形貌。
2.
Hf films were synthesized by ion beam assisted deposition(IBAD).
采用离子束辅助沉积方法 (IBAD)在Si(111)衬底上沉积了铪薄膜。
5) ion beam assisted deposition
离子束辅助沉积
1.
Amorphous and metastable crystalline phases formed by ion beam assisted deposition in immiscible systems;
离子束辅助沉积引发互不固溶系非晶相和亚稳晶相形成
2.
Preparation of high power laser films based on ion beam assisted deposition;
离子束辅助沉积制备高功率激光薄膜的研究
3.
Electron emission suppression characteristic of molybdenum grid coated with Hf by ion beam assisted deposition;
离子束辅助沉积铪膜抑制栅电子发射性能研究
6) ion beam assisted deposition (IBAD)
离子束辅助沉积
1.
In this work, we studied the microstructure, surface morphology, annealing performance, composition and mechanical properties of the Er-doped A1203 photonic thin films prepared by Ion Beam Assisted Deposition (IBAD) method.
本文通过不同的方法（TEM、AFM、SEM、XRD、EDX）研究了用离子束辅助沉积的方法制备的掺Er光波导Al_2O_3（和掺Er_2O_(3-) Al_2O_3、不掺Er-Al_2O_3）薄膜的微观结构、表面形貌、退火特性、成分以及力学性能等，试图对Al_2O_3薄膜从不同方面作以评价，为改进制备光波导镀膜方法提供重要的信息。
补充资料：等离子化学气相沉积
分子式：
CAS号：
性质：PCVD 化学气相沉积(CVD)法是制备无机材料，尤其是无机薄膜和涂层的一种重要手段。用等离子辅助CVD，可在较低的温度下沉积，涂层均匀不剥落。
CAS号：
性质：PCVD 化学气相沉积(CVD)法是制备无机材料，尤其是无机薄膜和涂层的一种重要手段。用等离子辅助CVD，可在较低的温度下沉积，涂层均匀不剥落。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条