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1)  Inner layer differential capacity
内层微分电容
2)  Double electrode layer differential capacity
双电层微分电容
3)  differential capacitance
微分电容
1.
The polarization, differential capacitance, flattening capability and reaction resistance of BH 51 zinc plating additive and its main components were all studied.
对BH 51氯化钾镀锌添加剂及其主要成分的极化性能、微分电容、整平性、反应电阻等进行了初步研究 ,结果表明 ,氯化钾镀锌添加剂可明显加大阴极极化 ,对镀层具有整平性。
2.
After treated the surface of NiNb2O6 photoelectrode by mechanical polishing +chemical etching + photoetching, the stable values of the differential capacitance of the spacecharge layer are measured,the relationship between flatband potential Vfb and pH value of the electrolyte is obtained,and the value of Vfb is compared with its theoretical calculating value.
对电极进行机械抛光加化学抛光加光抛光处理后,测得了NiNb2O6半导体光电极空间电荷层的微分电容的稳定值,得到了平带电势Vfb与电解液pH值间的关系,并与Vfb的理论计算值进行了比较。
3.
measure the differential capacitance(△Cd)of cassiterite-carbon paste.
2(kJ/mol);又用锡石和炭粉制得含锡石80%、炭粉20%的锡石-炭糊电极,在不同温度下测得该电极吸附辛基羟肟酸前后的微分电容变化量(△Ced),从而作得图,从图中求出该电极吸附辛基羟肟酸的吸附热△H=一40。
4)  differential capacity
微分电容
1.
The effect of additive AQ on the electrodepositing process of Cu~(2+) was studied by dynamic potential scanning of rota ting disc electrode, AC impedance and differential capacity, and the electrodepositing mechanism of copper was confirmed.
 为了有效地研究添加剂对铜电沉积的影响,选择合成了有机染料酸性镀铜添加剂AQ,用旋转圆盘电极动电位扫描、交流阻抗和微分电容等方法研究其对铜离子电沉积过程的影响,得到了铜的电沉积机理。
5)  differential capacitance measurement
微分电容法
1.
28V (vs SCE) in sulfuric acid solution were investigated by differential capacitance measurement and Mott-Schottky analysis.
利用微分电容法结合Mott-Schottky理论研究铅电极1。
6)  differential condenser
微分电容器
补充资料:微分电容
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性质:电极界面双电层类似于一个电容器,其特点是电容随电极电势而变化。对应于某一电极电势φ,如给予微变化dφ,需对双电层充以微电量dq,二者之比称为该电势下的微分电容 。它可用交流电桥法精确测定。微分电容对电极电势的关系图称为微分电容曲线,是研究电极吸附和电极界面结构的重要实验依据。

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