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1)  antireflective coating
减反膜
1.
Antireflective coatings for GaAs and ZnSe windows and lenses used with high power CO2 lasers;
用于高功率二氧化碳激光器的砷化镓及硒化锌窗口和透镜的减反膜
2.
Through computing and analysing reflection losses of various antireflective coatings consisting of SiO 2,Si 3N 4 or Al 2O 3 on the surface of Si optoelectric devices,the optimum data can be obtained.
本文通过计算、分析在 Si光电器件表面由 Si O2 、Si3N4及 Al2 O3组成的不同减反膜的反射损耗 ,得出了最优化的膜层组合。
3.
In order to improve the stability of AR coating, two series of antireflective coatings are prepared by sol- gel process with tetraethoxysilane as a precursor.
二氧化硅减反膜的结构疏松,且胶粒表面存在大量羟基,膜层极易吸附环境中的水分和有机蒸气,透射比稳定性较低。
2)  antireflection coating
减反膜
1.
According to the requirements of Television and IR dual-color guidance, a broadband antireflection coating on germanate substrate is developed.
根据电视/红外双色制导的要求,研制了锗酸盐基底上的双波段宽带减反膜
2.
Then a non-polarizing broadband antireflection coating with good optical performance within 600~900 nm was designed by using equivalent layer method.
分析了倾斜入射条件下导致光学薄膜产生偏振的原因,针对不同偏振态的等效导纳与等效相位进行了分析,并计算了对称膜层在45°入射条件下不同偏振态的等效折射率与等效相位厚度,采用等效层方法设计了光学性能良好的600~900 nm波段消偏振宽带减反膜
3.
ZnS, an significant optical material in IR regions, is applied in many opto electronic systems where a suitable antireflection coating is required to enhance the transmission.
硫化锌是红外波段重要的光学材料 ,在许多光电系统应用中 ,要求镀制适当的减反膜增加其透过率。
3)  AR coating
减反膜
1.
The AR coatings include: anti reflection coating with metal layer (narrow bandwidth, wide bandwidth and anti reflection coating with electrical static potential and magnetic shielding),ultra low AR coatings and large angle AR coatings meeting the requirement.
根据近年来实际应用中对减反膜的新的需求和指标要求,利用光学薄膜设计软件进行模拟和理论分析,采用常规的薄膜工艺和设备进行大量实验,设计并制备出三种新型的减反膜:含金属膜的减反膜(包括窄带金属减反膜,宽带金属减反膜,减反防静电抗电磁辐射膜),超低反射率减反膜和大角度减反膜,满足了实际器件的应用要求。
2.
The results showed that covalent bonding was formed between organic component PO and inorganic component SiO_2,and crystalline property of the AR coating does not change with the addit.
以聚氧化丙烯丙三醇醚(PO)为有机添加剂,正硅酸乙酯为前驱体,氨水为催化剂,利用溶胶-凝胶法制备出了一种新型的有机-无机分子复合二氧化硅减反膜
4)  antireflective film
减反膜
1.
The HfO2 and SiO2 films were coated using ion beam assisted deposition and e-beam deposition,and the antireflective films were coated by periodic ion beam assisted deposition and e-beam deposition also.
在研究阶段离子束辅助制备方式对薄膜性质影响的基础上,采用电子枪蒸发及离子束辅助沉积制备了氧化铪及氧化硅单层膜,采用阶段离子束辅助沉积及全程非离子束辅助沉积制备了基频减反膜
5)  Antireflective film
减反射膜
1.
Evaporation and Monitoring of High-efficiency SiO Antireflective Film;
SiO高效减反射膜的蒸镀和监控
6)  antireflection films
减反射膜
1.
The properties of coatings are analyzed theoretically and experimentally throughout the deposition process of ZrO2 antireflection films on facets of GaAlAs/ GaAs laser with semiconductor power amplification for the wavelength of 808 nm .
通过对波长808nm的GaAIAs/GaAs半导体功率放大激光器端面镀ZrO2减反射膜工艺过程,从理论和实验上分析了涂层特性,透射率由无膜时的69%和32。
2.
The properties of coatings have been analysed theoretically and experimentally thsoughout the deposition process of SiO antireflection films on facets of 1.
3μm InGaAsP/InP的半导体功率放大激光器端面镀SiO减反射膜工艺过程,从理论和实验上分析了涂层特性,透射率由无膜时的69%和32。
3.
The properties of coatings have been analysed theoretically and experimentally throughout the deposition process of SiO antireflection films on facets of GaAlAs/GaAs laser with semiconductor power amplification,and with a wavelength of 808 nm.
通过对波长808nm的GaA lAs/GaAs半导体功率放大激光器端面镀SiO减反射膜工艺过程,从理论和实验上分析了其涂层特性,透射率由无膜时的69%和32。
补充资料:减反射膜
减反射膜
antireflecting film

   涂敷在透明光学元件表面、用来消除或减弱反射光以达增透目的的光学薄膜。又称增透膜。最简单的减反射膜是单层介质膜,其折射率一般介于空气折射率和光学元件折射率之间,使用最普遍的介质膜材料为氟化镁。减反射膜的工作原理是基于薄膜干涉原理。入射光在介质膜两表面反射后得两束相干光,选择折射率适当的介质膜材料,可使两束相干光的振幅接近相等,再控制薄膜厚度,使两相干光的光程差满足干涉极小条件,此时反射光能量将完全消除或大大减弱。反射能量的大小是由光波在介质膜表面的边界条件确定,适当条件下可完全没有反射光或只有很弱的反射光。单层减反射膜只能对某个波长和它附近的较窄波段内的光波起增透作用,为在较宽的光谱范围达到更有效的增透效果,常使用多层介质膜。常见的多层膜系统是玻璃-高折射率材料低折射率材料-空气,简称gHLa系统。H层通常用二氧化锆(n=2.1)、二氧化钛(n=2.40)和硫化锌(n=2.32)等,L层一般用氟化镁(n=1.38)等。
   减反射膜广泛用于各种光学元件的表面处理,例如照相机镜头上涂减反射膜后,可减少由反射引起的杂散光并显著增加像的亮度。
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