1) silicon-oxide polyhedron
硅氧多面体
1.
NMR technology was used to research the silicon-oxide polyhedron structure in activated fly ash.
采用固相核磁共振 (NMR)技术 ,对粉煤灰在化学激发剂作用下硅氧多面体结构的变化进行了研究。
2) polyhedral oligomeric silsesquioxane
多面体低聚倍半硅氧烷
1.
Studies of polyhedral oligomeric silsesquioxane and polyhedral oligomeric silsesquioxane-polymer;
多面体低聚倍半硅氧烷及多面体低聚倍半硅氧烷-聚合物的研究进展
2.
The general formula of Polyhedral Oligomeric Silsesquioxane is (RSiO1.
多面体低聚倍半硅氧烷(Polyhedral Oligomeric Silsesquioxane，简称POSS)是指通式为(RSiO_(1。
3.
Polyhedral oligomeric silsesquioxane (POSS) is a kind of peculiar particle with cage type structure in nano-size.
多面体低聚倍半硅氧烷(POSS)具有特殊的纳米级笼形结构,与聚合物有良好的结合性和相容性,采用POSS改性聚合物可制备分子级分散的纳米复合材料。
3) polyhedral silsesquioxane
多面体倍半硅氧烷
1.
An organic - inorganic nanostructure material of polyhedral silsesquioxane ( PSSO ) coating film derived from (γ - methacryloxylpropyl) trimethoxysilanes (MPTS) was synthesized via sol -gel processing.
利用溶胶-凝胶法制备了有机-无机纳米结构材料多面体倍半硅氧烷(PSSO)材料Γ -(甲基丙烯酰氧)丙基倍半硅氧烷膜(MPTS)。
4) polyhedral Oligomeric silsesquioxane (POSS)
多面体齐聚倍半硅氧烷
5) Poly-Si/SiO_2 interface
多晶硅/氧化硅面
6) silicate tetrahedron
硅氧四面体
1.
The changes of silicate tetrahedron of fly ash in the process of mechanical grinding were analyzed by trimetheylsilicane(TMS).
采用三甲基硅烷化分析技术 (TMS) ,研究了粉煤灰机械研磨过程中硅氧四面体结构的变化趋势 。
补充资料：十八烷氧基封端二甲基(硅氧烷与聚硅氧烷)
CAS：68554-53-0
中文名称：十八烷氧基封端二甲基(硅氧烷与聚硅氧烷)
英文名称：Siloxanes and Silicones, di-Me, (octadecyloxy)-terminated
中文名称：十八烷氧基封端二甲基(硅氧烷与聚硅氧烷)
英文名称：Siloxanes and Silicones, di-Me, (octadecyloxy)-terminated
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条