The influence of glow discharge parameters,such as time of presputter and integrating on the intensity stability of four elements in steel as well as the spectral behavior of the four elements in glow discharge were tested.

XPS study of Ni_(49.54)Mn_(29.59)Ga_(20.87) magnetically driven shape memory alloy thin film fabricated by D.C magnetron sputtering technique;

Growth and characterization of aluminum nitride films by penning-type discharge plasma sputtering process;

Growth of TiN Film by Modified Ion Beam Enhanced Magnetron Sputtering;

In order to improve appearance and hydrophobicity of waterproof and moisture permeable coatings, the yellowish of sputtered polymeric fluorocarbon films was investigated.

By means of the Monte-Carlo simulation based on the binding collision approximation,this paper investigates the sputtering of Silver and Cadmium element targets bombarded by 27 keV Ar+ ions and studies the spatial distribution of sputtered atoms by collision cascade.

The XRD patterns of SnO2 thin film sputtered with different methods are compare 1 for their difference in the field of structure.

Cu films sputtered with applied magnet under substrate and their microstructures;

Zinc Oxide Thin Films Prepared Using Microwave ECR Plasma Sputtering Method;

Study of TiN Thin Film by Microwave ECR Plasma Reaction Sputtering Deposition;

However the waterfall model can not simulate the waterfall effect very well and the system lacks proper model to represent the spattering of stream.

The preparation of ZnO film using two methods of spattering is also presented.

Influence of target self-bias in inverted cylindrical RF sputtering on the microstructure and electrical properties of Ba_(0.65)Sr_(0.35)TiO_3 thin films;

Study of 3C-SiC and 4H-SiC films deposited using RF sputtering method;

Nanocrystalline TiO_2 thin films were prepared by reactive RF sputtering, then the samples were treated by Ar radio frequency plasma.