1) HfO_(2)/SiO_(2)
HfO2/SiO2
2) HfO 2/SiO 2 coatings
HfO2/SiO2薄膜
3) HfO_2/SiO_2 high reflecting coatings
HfO2/SiO2高反膜
4) HfO 2/SiO 2 HR coatings
HfO2/SiO2高反射薄膜
5) HfO 2
HfO2
1.
A novel technique has been developed to selectively etch HfO 2 and RZJ 306 photo-resist by adjusting RF self-bias and the gas pressure of the inductively coupled plasma of CHF 3,Ar and H 2.
通过改变偏压功率和气体气压的宏观条件 ,利用CHF3 ,Ar和H2 的感应耦合等离子体 (ICP)对HfO2 和RZJ 30 6光刻胶进行了刻蚀选择性实验研究。
2.
High k dielectric HfO 2 films were deposited on p type Si(100) substrates by e beam evaporation.
使用高真空电子束蒸发在p型Si(1 0 0 )衬底上制备了高kHfO2 薄膜 。
3.
HfO 2/SiO 2 multilayer reflective mirrors were deposited on BK7 substrates by E-beam evaporation.
用两种不同纯度的HfO2 材料与同一纯度的SiO2 材料组合 ,沉积λ/ 4规整膜系 (HL) 11H形成 2 6 6nm的紫外反射镜 ,发现反射率相差 0 。
6) silica
[英]['sɪlɪkə] [美]['sɪlɪkə]
SiO2
1.
The factors influencing the modifying efficiency,such as amount of modifier,modifying time,rotating speed of the mill and ratio of ball and silica,were discussed.
以含氢硅油为改性剂,用机械化学法对SiO2粉体进行表面改性,通过测定接触角和TGI、R、TEM等手段表征改性效果,讨论了改性剂用量、改性时间、磨机转速、球料比等因素对改性效果的影响。
2.
Core/shell composite microparticles with silica nanoparticle as core and crosslinked poly(tert-butylmethacrylate) as shell were prepared by seed-emulsion polymerization utilizing 3-(trimethoxysilyl)propyl methacrylate(MPS) modified silica particles as seeds,tert-butylmethacrylate as monomer and sodium dodecyl sulfate(SDS) as emulsifier.
以甲基丙烯酸-3-(三甲氧基硅基)丙酯(MPS)修饰的SiO2胶体粒子为种子,甲基丙烯酸叔丁酯(tBMA)为单体、十二烷基硫酸钠(SDS)为乳化剂,采用种子乳液聚合法制备了SiO2/聚甲基丙烯酸叔丁酯的核壳复合微粒。
3.
By using of the alkalinity catalyst of ammonia and controlling the water content, the ethyl-orthosilicate occured hydrolytic reaction to form nano-silica dispersed in ethanol, then washed, dried and silica nanoparticles were prepared.
将正硅酸乙酯和乙醇的混合溶液加入到乙醇、水和氨水的混合溶液中,水解制备出单分散SiO2的乙醇分散液,然后分离出SiO2纳米粒子。
补充资料:acetic acid, dianhydride with silicic acid (h4sio4) bis(1,1-dimethylethyl) este
CAS:13170-23-5
分子式:C12H24O6Si
分子质量:292.40
沸点:102℃(5 t
中文名称:二叔丁氧二乙酰氧基硅
英文名称:Acetic acid, dianhydride with silicic acid bis(1,1-dimethylethyl) ester
di-tert-Butoxydiacetoxysilane
di(tert-butoxy)diacetoxy-Silane
acetic acid, dianhydride with silicic acid (h4sio4) bis(1,1-dimethylethyl) este
di-t-butoxydiacetoxysilane
Acetic acid,dianhydride with silicic acid bis(1,1-dimethylethyl)ester
Silane,di(tert-butoxy)diacetoxy-
分子式:C12H24O6Si
分子质量:292.40
沸点:102℃(5 t
中文名称:二叔丁氧二乙酰氧基硅
英文名称:Acetic acid, dianhydride with silicic acid bis(1,1-dimethylethyl) ester
di-tert-Butoxydiacetoxysilane
di(tert-butoxy)diacetoxy-Silane
acetic acid, dianhydride with silicic acid (h4sio4) bis(1,1-dimethylethyl) este
di-t-butoxydiacetoxysilane
Acetic acid,dianhydride with silicic acid bis(1,1-dimethylethyl)ester
Silane,di(tert-butoxy)diacetoxy-
说明:补充资料仅用于学习参考,请勿用于其它任何用途。
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