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1)  soft metal thin film
软金属薄膜
1.
The methods of determining the Young's modulus of film-only applicable for the soft metal thin films on hard substrate were investigated.
对等离子法制备的400nm厚Cu膜-Si(100)基底系统(退火温度为300℃)进行了纳米压入实验,目的是寻找一种可靠的软金属薄膜本征模量的评定方法。
2)  metallic film
金属薄膜
1.
The adhesion property of Au/NiCr/Ta multi-layered metallic films was investigated by the indentation method,rolling contact fatigue method and scratch method with both friction and acoustic emission modes.
针对Al2O3基体上磁控溅射沉积的Au/NiCr/Ta多层金属薄膜,用压痕法、滚动接触疲劳法、摩擦力和声发射两种模式同时监测的划痕法,对比研究了金属薄膜与基体的结合性能。
2.
Au/NiCr/Ta and Au/NiCr metallic multilayers were deposited on A1203 substrate by magnetron sputtering and their critical load (La) was studied by scratch method with friction and acoustic emission mode, moreover, the scratch curve and morphology of metallic films were compared with TiN film.
采用摩擦力和声发射两种模式同时监测的划痕法研究了 Au/NiCr/Ta和 An/NiCr多层金属薄膜的临界载荷 Lc,并与TiN硬质薄膜进行了对比。
3.
The relationship between resistivity of metallic film and its surface roughness, residual stress was investigated according to experimental results.
针对磁控溅射Au金属薄膜,从实验角度研究了该薄膜电阻率与表面粗糙度、残余应力的关系,并对结果进行了分析。
3)  metal film
金属薄膜
1.
A unified model for 1/f noise and 1/f~2 noise due to electromigration in metal film;
金属薄膜电迁移1/f噪声与1/f~2噪声统一模型
2.
Application of metal film thermal resistor to pressure sensor;
金属薄膜式热敏电阻器在压力传感器中的应用
3.
A group of experiments of metal film preparation and physical property measurement;
金属薄膜制备及物性测量系列实验
4)  metal thin film
金属薄膜
1.
Mechanical properties of metal thin film characterized by trilayer microbridge testings;
三层微桥法测量金属薄膜力学性能的研究
2.
Based on the hyperbolic two-step thermal conduction model,the two dimensional thermo-mechanical coupling of metal thin film under short pulse laser heating is investigated with finite element method.
从电子-声子相互作用的双曲型两步热传导模型出发,考虑到金属体内晶格对热传导的影响,采用有限元法,直接在时间域中求解了金属薄膜内受短脉冲激光加热的二维热机耦合问题,避免了以往因电子-声子能量方程之间的耦合关系给二维热响应问题解析求解带来的困难,提高了用数值反变换工作时计算的精度,减少了工作量,得到了金属薄膜内二维热机耦合问题的温度、位移和应力的变化规律。
5)  metallic films
金属薄膜
1.
Relationship between plating and magnetron sputtering for metallic films;
化学镀金属薄膜与磁控溅射的关联性
2.
Several methods to improve the linearity of anisotropic magnetoresistance (AMR) sensors were suggested based on the analysis of the generation of nonlinearity in magnetoresistive sensors of metallic films.
在分析金属薄膜磁电阻传感器非线性产生原因的基础上,提出了几种设计AMR(各向异性磁电阻)薄膜磁电阻传感器时改善其线性度的方法。
3.
Applying Green s function approach and the hobo formula,we have calculated the conductivities of metallic wires and metallic films,these formulas are foundto associate with size of metal,and possess the quantum size effects.
运用量子统计的格林函数方法和久保公式分别计算一维金属线、二维金属薄膜的杂质散射电导率,计算结果表明,小尺寸金属系统的电导率眼金属系统的尺寸大小有关,具有量子尺寸效应。
6)  Metal thin films
金属薄膜
1.
A brief introduction is given of new studies on quantum well effect to explain the exchange coupling in metal thin films, in which the moving behavior of electrons in quantum wells is analogous to the vibration of a classical string.
通过对电子在量子阱中的运动行为与经典的弦振动的类比,形象地介绍了金属薄膜中磁性交换耦合的量子阱效应机制研究新进展。
补充资料:金属化纸和金属化薄膜
      表面上蒸镀一层很薄 (0.1微米左右)的金属层的纸或薄膜。金属化纸曾应用于电缆、变压器作为屏蔽层,现多用于制造电容器。金属化纸和金属化薄膜的特点是具有自愈性,即当某处击穿时,短路电流使击穿部位周围的金属膜熔化并蒸发而又恢复绝缘性能,因此显著减少纸或薄膜中贯穿性导电疵点和弱点对击穿强度的影响,从而提高工作场强。低压纸介电容器如用铝箔极板(6~7微米),必须用2~3层纸或薄膜,若用金属化纸或金属化薄膜,只要1层即可,极板的厚度也由6~7微米减少到0.1微米左右,大大节省材料。直流或脉冲电容器用金属化纸时,为了提高绝缘电阻,可以在纸的单面或双面涂以约1微米厚的快干纤维漆,然后在真空中蒸镀0.1微米的金属膜。交流电容器用的金属化纸或金属化薄膜,为了不使介质损耗增大,不喷漆,而是在纸或薄膜表面上直接蒸镀金属膜。用于蒸镀金属膜的金属有锌、镉、镍和铝等,以锌最适合(沸点较低)。有些薄膜(例如聚酯薄膜)可以先在表面上蒸镀银层,然后再蒸镀锌层。
  
  金属化纸或金属化薄膜吸潮后,特别是在较高温度下容易被损伤腐蚀,在储存、加工过程中要采取适当的防潮措施。金属化纸一般不可用氯化物浸渍,以防止纸中析出的氢同氯化物浸渍剂析出的氯作用形成腐蚀性的氯化氢;但加了某些特殊的稳定剂后也可以用氯化物浸渍。
  

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