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1)  C/Cr coatings
C/Cr镀层
2)  Cr-C coating
Cr-C镀层
1.
The Cr-C coating was prepared by means of a closed field unbalanced magnetron sputter ion plating technique on high speed steel.
利用闭合场非平衡磁控溅射离子镀技术在高速钢表面制备Cr-C镀层。
3)  Cr/C coating
Cr/C镀层
1.
The variation of phase structures,microhardness and adhesion of coatings at different temperatures were investigated in order to evaluate the thermal stability of Cr/C coating.
在空气炉加热环境下于不同温度对采用磁控溅射离子镀技术制备Cr/C镀层样品进行加热保温处理。
2.
The results indicate that :chromium carbide in Cr/C coatings prepared by sputtering graphite targets are mainly Cr3C2.
结果表明:该方法制备的Cr/C镀层中碳化物相主要是Cr3C2。
3.
Cr/C coatings were deposited on high speed steel and silicon wafers substrates by Magnetron sputtering,using sputtering graphite target as the mainly source for carbon element.
本文采用磁控溅射技术以溅射石墨靶作为碳元素主要来源的方法在高速钢和单晶硅基体上制备了Cr/C镀层。
4)  C/Cr composite coating
C/Cr复合镀层
1.
The hardness,corrosion resistance,bonding force between coating and matrix and friction coefficient of the C/Cr composite coating deposited by non-equilibrium magnetron sputtering were analyzed.
采用非平衡磁控溅射在GW93镁合金表面制备了镀C/Cr复合镀层,分析了不同本底真空度下在GW93镁合金表面进行非平衡磁控溅射镀C/Cr复合镀层的硬度、耐蚀性、膜基结合力,摩擦系数等。
5)  Electroplating Cr-C
电镀Cr-C
6)  black Cr-C nano-composite coating
黑Cr-C纳米复合镀层
1.
The influence of current density on the microstructure and properties of black Cr-C nano-composite coatings is investigated.
研究了电流密度对黑Cr-C纳米复合镀层组织及性能的影响。
补充资料:磁性镀层
分子式:
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性质:用于提高某些金属或非金属零件的磁性要求的电镀层。如录音机或电子计算机等设备中的录音带、磁环线、记忆鼓等储存系统,一般镀镍铁、镍钴、镍铬磷等合金。通过改变电镀工艺参数,可获得不同性能的磁性镀层。

说明:补充资料仅用于学习参考,请勿用于其它任何用途。
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