1) nanosphere lithography
纳米球刻蚀
1.
Fabrication and optical properties of 2D ordered arrays of CdS nanocrystals by nanosphere lithography;
纳米球刻蚀法制备的二维有序的CdS纳米阵列及其光学性质的研究
2.
Large-area Co nanoparticle arrays and Co nano-granular films with core-shell strucutre are preparaed using Nanosphere Lithography.
本文利用纳米球刻蚀法制备了大面积的Co磁性纳米颗粒阵列,以及核壳结构的Co磁性纳米颗粒膜,SEM图显示它们具有较好的形貌,VSM分析显示了其磁学性质,发现在样品内形成单畴结构,Co磁性纳米颗粒阵列比Co磁性纳米颗粒膜的矫顽力有较大的提高,矩形比却有升有降,本文重点讨论了其中的影响因素。
2) nanolithography
纳米刻蚀
1.
Applications of Scanning Probe Microscopy in Nanolithography on Alkanethiol Self-assembled Monolayers;
扫描探针显微术在巯醇自组装单分子膜纳米刻蚀中的应用
2.
The combination of scanning probe micronoscopy(SPM) nanolithography and selfassembly method has made it possible to fabricate not only planned functional nanostructures on solid substrate,but also the complex architectures with well controlled over a wide range of length scales and nanodevice.
本文在简单介绍扫描探针加工技术和分子自组装膜制备的基础上,总结了原子力显微镜纳米刻蚀和分子组装相结合的最新进展,并着重介绍了具有广泛应用前景和研究进展的构筑纳米刻蚀法和蘸笔水刻蚀法。
3) Nano-machanical lithography
纳米机械刻蚀
1.
Nano-machanical lithography technique based atomic force microscope(AFM) is the important part of the scanning probe lithography(SPL),which has made a great progress.
基于原子力显微镜AFM(atomic force microscope)的纳米机械刻蚀加工是扫描探针刻蚀加工技术(scanning probe lithography,SPL)的一个重要组成,目前已取得较大进展。
4) Dip-pen nanolithography (DPN)
蘸笔纳米刻蚀技术
5) nanolithography
纳米光刻
1.
Numerical simulation of probe induced surface plasmon resonance coupling nanolithography;
数值模拟探针诱导表面等离子体共振耦合纳米光刻
2.
The fabrication of nanostructures,an important part of nanotechnology,is based upon nanolithography which will be widely employed in the future.
纳米光刻技术是制作纳米结构的基础,具有重要的应用前景。
3.
The fabrication of nanostructures, an important part of nanotechnology, is based upon nanolithography which will be widely employed in the future.
纳米光刻技术是制作纳米结构的基础 ,具有重要的应用前景 。
6) nanometer lithography
纳米光刻
1.
In the application of nanometer lithography, two gratings with similar periods were chosen for alignment marks on the wafer and mask respectively.
在纳米光刻中,采用周期相差不大的两光栅分别作为掩模和硅片上的对准标记。
补充资料：褊刻
1.褊急刻薄。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条