1.
Structure and mechanical properties of DLC films by pulsed vacuum arc ion deposition
脉冲真空电弧离子镀沉积类金刚石薄膜的结构和力学性能研究
2.
Study of CrAlN Film Deposited by Pulsed Bias Arc Ion Plating;
脉冲偏压电弧离子镀CrAlN薄膜性能研究
3.
Fundamentals of Pulsed Bias Arc Ion Plating;
脉冲偏压电弧离子镀的工艺基础研究
4.
Process and Property of the ZrN Coating Made by Vacuum Arc Ion Plating
真空电弧离子镀ZrN涂层的工艺与性能
5.
Dielectric Films of TiO_2 and AlN by Pulsed Bias Arc Ion Plating;
脉冲偏压电弧离子镀沉积TiO_2与AlN介电薄膜
6.
Superhard Multilayer Films Prepared by Pulsed Bias Arc Ion Plating;
脉冲偏压电弧离子镀沉积超硬多层薄膜
7.
Preparation and Characterization of Nanometer Hard Films by PBAIP;
脉冲偏压电弧离子镀纳米硬膜的制备与表征
8.
Investigation on Plasma Load Characteristic and Pulsed Bias Power Supply of Arc Ion Plating
电弧离子镀的等离子体负载特性与脉冲偏压电源研究
9.
The Arc Ion Plating Deposition of TiAlN Film Aided by Pulse N Ion Beam
脉冲N离子束辅助电弧离子镀沉积TiAlN膜层的研究
10.
Study on Multi-Component （TiMe）N Hard Coatings Synthesized by Pulsed Bias Arc Ion Plating;
脉冲偏压电弧离子镀（TiMe）N多元复合硬质薄膜研究
11.
The Preparation Technology and Properties of CrN Coating Deposited by Superimposed Pusle Bias Cathodic Arc Ion Plating
脉冲偏压电弧离子镀氮化铬涂层的制备技术及性能
12.
COMPOSITION,MICROSTRUCTURE AND PROPERTIES OF C-N-Cr FILMS DEPOSITED BY PULSED BIAS ARC ION PLATING
脉冲偏压电弧离子镀C-N-Cr薄膜的成分、结构与性能
13.
Surface Properties and Fabrication of TiAlN Films Using Vacuum Arc Ion Plating with Separated Targets;
分离靶真空电弧离子镀制备TiAlN膜层及其性能研究
14.
Multi-arc ion plating technique is using cool cathode with self-maintaining arc discharge as evaporation source.
多弧离子镀技术是一种在真空中将冷阴极自持弧光放电用于蒸发源的镀膜技术。
15.
Study on Macroparticles Reduction for Vacuum Cathodic Arc Source
真空阴极电弧离子镀层中宏观颗粒去除技术研究
16.
Fabrication of Ti-O Film by Vacuum Magnetic Filtered Arc Plasma Deposition and Its Blood Compatibility
真空磁过滤电弧离子镀制备氧化钛薄膜及其血液相容性
17.
Development of High Frequency Pulse Power Supply For Internal Pressure Estimation of Vacuum Interrupters
真空灭弧室真空度检测用高频脉冲电源研制
18.
Effect of Pulsed Bias and Post-annealing on Structure and Performance of N-doped TiO_2 Films Deposited by Arc Ion Plating
脉冲偏压及退火处理对电弧离子镀N掺杂TiO_2薄膜结构和性能的影响