1.
Ti–Si–C–N Based Nanocomposite Coatings Produced by Plasma Enhanced Magnetron Sputter Deposition and its Erosion Resistance
等离子增强磁控溅射Ti–Si–C–N基纳米复合膜层耐冲蚀性能研究
2.
MW-ECR Plasma Enhanced Unbalance Magnetron Sputtering and Carbon Nitride Films Preparation;
微波-ECR等离子体增强非平衡磁控溅射技术及CN薄膜的制备研究
3.
Plasma emission spectra of ZnO and ZAO thin film grown by RF magnetron sputtering
ZnO和ZAO薄膜磁控溅射等离子体发射光谱
4.
Plasma emission diagnostics for the optimization of deposition parameters in RF magnetron sputtering of GaP film
等离子体发射光谱诊断用于射频磁控溅射GaP薄膜的工艺参数优化
5.
Study on Compositions Controlling and Properities of Magnetron Sputtering Films Based on Plasma Optical Emission Spectroscopy
基于等离子体光发射谱的磁控溅射薄膜成分控制及性能研究
6.
Plasma Characteristics of Mid-frequency Dual-targets Magnetron Sputtering System and Oxide Films Deposition Research;
中频孪生磁控溅射等离子体特性与氧化物薄膜沉积研究
7.
Electrical Characteristics and TiN Film Deposition of Plasma Assisted Magnetron Sputtering;
外部等离子源辅助磁控溅射电特性及TiN薄膜制备研究
8.
The Barrier Mechanism Research of The Ceramic Thin Film by Plasma Auxiliary Magnetron Sputtering
等离子辅助磁控溅射陶瓷薄膜阻隔机理的研究(英文)
9.
Computer Simulation of the Transportation and the Sputtering of Ions in RF Magnetron Sputtering;
射频磁控溅射镀膜过程中离子输运和溅射行为的模拟计算
10.
Preparation of SiO_2 ion barrier film with RF magnetron sputtering
射频磁控溅射制备SiO_2防离子反馈膜工艺探讨
11.
Plasma Emission Monitoring and TiO_2 Films Growth by Mid-Frequency Dual Magnetron Reactive Sputtering
等离子体发射监控系统参与的中频孪生反应磁控溅射沉积TiO_2薄膜的实验研究
12.
plasma sputter combined etching
等离子溅射复合刻蚀
13.
Preparation of AIN Film by Medium Frequency Sputtering and Investigation of Ions Implanted AIN Film;
中频磁控溅射制备AIN薄膜及其离子注入研究
14.
Study on SiO_x Coating Deposition by Magnetron Sputtering with Ion Beam Assisted;
离子源辅助磁控溅射沉积SiO_x阻隔薄膜的研究
15.
Study on Property of High-speed Steel Deposited TiN Coatings by Magnetron Sputter Ion Plating
高速钢磁控溅射离子镀TiN涂层的性能研究
16.
Study on ion release of Ni from dental NiCr alloy by plasma magnetron reactive sputter deposition
牙科用镍铬合金表面等离子磁控溅射氮化钛膜对镍离子析出的影响
17.
Studies to the Preparation and Characterization of SERS Active Substrates by Magnetron Sputtering;
基于磁控溅射技术的表面增强拉曼散射（SERS）基底制备及其特性研究
18.
Studies on Discharge Characteristics and Applications of ICP Enhanced Unbalanced Magnetron Sputtering in Cusp-field Confined Magnetron;
会切场约束ICP增强非平衡磁控溅射放电及应用研究