1.
Preparation and Properties of TiAlN Thin Films by Dual-target D.C. Reactive Magnetron Co-sputtering
双靶直流反应磁控共溅射沉积TiAlN薄膜及其性能研究
2.
Microstructure and Electrical Properties of Al-Pb Composite Thin Films by Magnetron Co-deposition
磁控溅射共沉积Al-Pb复合薄膜微观结构及电性能
3.
Computer Simulation of Thin Film Deposition by RF Magnetron Sputtering;
射频磁控溅射沉积薄膜的计算机模拟
4.
The Application of Sputtering Deposition Technique of TiC to Cutters
溅射沉积碳化钛技术在刀具上的应用
5.
Investigation of High Dielectric Ta_2O_5 Thin Films Deposited by Reactive Sputtering;
反应溅射沉积高介电Ta_2O_5薄膜研究
6.
Copper films on flexible PI subtrate prepared by roll magnetron sputtering
卷绕式磁控溅射法沉积PI-Cu膜
7.
Preparation of NiO thin films by DC sputtering and structure characterization
直流溅射沉积氧化镍薄膜及结构表征
8.
Reflectance of Ir Layer in Vacuum Ultraviolet Wavelength Region Deposited by Ion Beam Sputtering
离子束溅射沉积Ir膜真空紫外反射特性研究
9.
Deposition rate is increase quickly with sputtering power.
结果表明溅射功率对沉积速率的影响最大，随溅射功率的增大沉积速率快速增大。
10.
Study of MoS_2-Ti Composite Coatings Deposited by Unbalanced Magnetron Sputtering;
非平衡磁控溅射沉积MoS_2-Ti复合薄膜研究
11.
Study on SiO_x Coating Deposition by Magnetron Sputtering with Ion Beam Assisted;
离子源辅助磁控溅射沉积SiO_x阻隔薄膜的研究
12.
Improvement of CdO Thin Films Deposited by DC Magnetron Sputtering;
磁控溅射法沉积透明导电CdO薄膜的性能优化
13.
Characterization and Texture of Magnetron Sputtered Ag Thin Films After Annealing;
磁控溅射沉积银薄膜退火织构及其表征
14.
Study on NiCoCrAlY Coating Using Unbalanced Magnetron Sputtering on Titanium Alloy Surface
钛合金表面非平衡磁控溅射沉积NiCoCrAlY涂层
15.
Preparation of Uranium Film by Ultra High Vacuum Magnetron Sputtering and Its Characterization
超高真空磁控溅射法沉积铀薄膜及其表面状态
16.
Growth and Mechanical Properties of Stainless Steel Thin Films Prepared by DC Magnetron Sputtering on Al Alloy Foil
铝表面磁控溅射沉积不锈钢薄膜及其性能
17.
Effect of Process Parameters on the Deposition of DC Magnetron Sputtered Films
工艺参数对直流磁控溅射膜沉积的影响
18.
Research on Photoelectric Characteristics of ITO Film Prepared by DC Magnetron Sputtering at low Temperature
磁控溅射低温沉积ITO薄膜及其光电特性研究