1.
Numerical Simulation and Experimental Research of Slurry Film Characteristic in Chemical Mechanical Polishing
CMP中抛光液膜特性的数值仿真和实验研究
2.
Study on CMP Slurry of CVD Diamond Film;
CVD金刚石膜化学机械抛光液的研制
3.
double-die-turning finishing hydraulic press
双模具翻转抛光液压机
4.
Study on CMP Nano-Slurry and Technology;
CMP纳米抛光液及抛光工艺相关技术研究
5.
Chemical mechanical polishing for silicon wafer by composite abrasive slurry
利用复合磨粒抛光液的硅片化学机械抛光
6.
Fundamental Study on High-efficiency Polishing for CVD Diamond Thick Film;
CVD金刚石厚膜高效抛光的基础研究
7.
Study on Tribochemical Polishing Technique of CVD Diamond Film;
CVD金刚石膜摩擦化学抛光技术研究
8.
Development of Wheel for CVD Diamond Thermo-Chemical Polishing
CVD金刚石膜热化学抛光盘的研制
9.
Study on CMP Slurry of ULSI Copper Interconnection Layer;
ULSI铜互连层CMP抛光液研究
10.
Study on CMP Slurry Prescription of SiO_2 ILD;
二氧化硅介质层CMP抛光液配方研究
11.
Numerical Simulation of Slurry Film Lubrication in Chemical Mechanical Polishing Process;
CMP过程中抛光液流场数值仿真研究
12.
Study on Dynamic Pressure and Temperature of Slurry in Chemical-Mechanical Polishing of Silicon Wafer
硅片化学机械抛光加工区域中抛光液动压和温度研究
13.
Influence of abrasive and chemical composition on chemo-mechanical polishing of MgO single crystal substrate
抛光液中磨料和化学成分对单晶MgO基片化学机械抛光的影响
14.
Study on Principle of Hydrodynamic Suspension Ultra-smooth Machining and Dynamic Pressure of Polishing;
液流悬浮超光滑加工机理及抛光动压力的研究
15.
Effect of acid alkali degree on quality of super smooth surface
抛光液酸碱度对超光滑表面质量影响的研究
16.
thick film liquid dye laser
厚膜液体染料激光器
17.
Research on Polishing Diamond Film by Chemical Mechanical Polishing Methods;
单晶金刚石及金刚石膜化学机械法抛光研究
18.
The Research on Chemical Polishing and Chemical Conversion Coating on AM60 Magnesium Alloy
AM60镁合金化学抛光及化学转化膜的研究