1.
Extraction and Analysis of Substrate Parameters in On-Chip Spiral Inductor Lumped Model
片上螺旋电感集总模型中衬底因子的分析与拟合
2.
Analysis of Influencing Factors of Sapphire Substrate CMP Removal Rate
蓝宝石衬底材料CMP去除速率的影响因素
3.
headgear consisting of hat foundations covered with felt chemises (i.e., handkerchief felts)
帽子,由毛毡塞布（即：薄型毛毡）包盖的帽衬底组成
4.
ZnS, ZnSe Films and ZnSe Quantum Dots Grown by MOCVD;
Si衬底上低压MOCVD生长ZnS，ZnSe薄膜和ZnSe量子点
5.
The Nitride Coatings on Aluminium Alloy Substrate by Arc Ion Plating;
铝合金衬底电弧离子镀氮化物膜层的研究
6.
A Study of Removal Techniques of Contamination on Si Wafers in Microelectronics;
微电子器件硅衬底表面污染物去除技术的研究
7.
Growth and Characterization of Si-based Strain Relaxed SiGe Substrate and SiGe/Si Quantum Wells
Si基SiGe弛豫衬底及SiGe/Si量子阱生长与表征
8.
Analysis by Finite Element Method of Substrate Thickness of Microstrip Patch Antenna Surrounded by Photonic Band Gap Structure
环绕光子晶体微带贴片天线衬底厚度影响分析
9.
Preparation of SiGe Buffer Layer by Oxidation of SiGe/Si MQW Structure
氧化SiGe/Si多量子阱制备Si基SiGe弛豫衬底
10.
Study on the Quantum Efficiency of Amorphous Silicon Thin Film Solar Cells Deposited on Polymeric Substrate
柔性衬底非晶硅薄膜太阳电池量子效率的研究
11.
Ultrafast Carrier Dynamics in Surface of Silicon-on-Insulator
绝缘衬底上硅表面载流子的超快动力学研究
12.
rammed bottom lining
捣筑(的)衬底, 捣筑炉底
13.
Study on Electron Irradiation of Poly-Si Thin Films and Poly-Si Thin Film Solar Cells and Preparing of Ceramic Silicon for Substrates of Poly-Si Thin Films;
薄膜太阳电池及其陶瓷硅衬底材料的制备和电子辐照研究
14.
Preparation and Optical Characterization of ZnSe, ZnTe Films and Quantum Well Structures on Si Substrate by LP-MOCVD;
Si衬底上ZnSe，ZnTe薄膜及其量子阱的LP-MOCVD生长和光学特性
15.
Si-base Ge Quantum-Dots Photodetector Used in Fiber Communication Field
基于Si衬底Ge量子点光纤通信用光电探测器研制
16.
Effect of substrate bias on microstructure and properties of diamond-like carbon films by linear ion beam system
衬底负偏压对线性离子束DLC膜微结构和物性的影响
17.
Analysis of Pseudomonas syringae pv. tabaci Adsorption on Different Substrates Revealed by Atomic Force Microscopy
烟草野火病菌在不同衬底上吸附的原子力显微镜研究
18.
Effects of hydrogen plasma pretreatment of substrate on the growth of microcrystalline silicon film
衬底H等离子体预处理时间对微晶硅薄膜生长的影响