1.
Influence of Substrate Temperature on the Growth of μc-SiGe Thin Film
衬底温度对氢化微晶硅锗薄膜生长的影响
2.
Optimized Growth Conditions and High Deposition Rate of μc-Si∶H Films
氢化微晶硅薄膜的两因素优化及高速沉积
3.
Study of a-Si:H Microstructure by MWECR CVD Technique;
MWECR CVD制备氢化非晶硅薄膜的微结构研究
4.
Metal-Induced Crystallization of Amorphous Silicon and Silicon Germanium Films
非晶硅和非晶硅锗薄膜的金属诱导结晶
5.
Research Progress on the Hydrogen Content Control of Hydrogenated Amorphous Silicon Thin Films
氢化非晶硅薄膜H含量控制研究进展
6.
Microcrystalline Silicon-Germanium Thin Films by RT-Pecvd and Its Application to Solar Cell;
反应热CVD法制备微晶硅锗薄膜及其太阳电池应用研究
7.
Research in Growth of Poly-Si_(1-x)Ge_x on SiO_2 by UHVCVD;
利用UHV/CVD在SiO_2薄膜上生长多晶锗硅薄膜的研究
8.
Studies of a-Si:H Microstructure by Hot Wire Assisted Mwecr CVD Technique;
热丝辅助MWECR CVD制备氢化非晶硅薄膜的微结构研究
9.
Research on the Preparation, Microstructure and Optoelectronic Properties of Hydrogenated Amorphous Silicon Thin Films
氢化非晶硅薄膜制备及其微结构和光电性能研究
10.
Experimental Study of Internal Friction of a-Si:H Films Charged with Hydrogen
氢化非晶态硅薄膜的渗氢内耗实验研究
11.
Influence of Hydrogen on Microcrystalline Silicon Thin Film in Low Temperature Deposition and Annealling Process
氢在微晶硅薄膜低温沉积及退火过程中的影响
12.
Study of Photoelectric Properties of a-Si:H Deposited by MW-ECR CVD;
MW-ECR CVD制备氢化非晶硅薄膜之光电特性研究
13.
Fabrication of Hydrogenarated Amorphous Silicon Thin Films by PECVD and the Study of Metal Induced Crystallization;
PECVD法制备氢化非晶硅薄膜及其金属诱导晶化研究
14.
Influence of Hydrogen Flow on Grain Size of Nano-Crystalline Sic Films Grown by HFCVD Method
HFCVD法制备纳米晶体碳化硅薄膜中氢流量对晶粒尺寸的影响
15.
Effect of hydrogen dilution on crystalline properties of nano-crystalline silicon thin films in fast growth
氢稀释对高速生长纳米晶硅薄膜晶化特性的影响
16.
Study on the Microstructure of Microcrystalline Silicon Thin Films by VHF-PECVD
VHF-PECVD制备微晶硅薄膜的微结构研究
17.
Investigation on Preparing an Even Large Area and Excellent Optoelectric Properties Hydrogenated Amorphous Silicon Film with Higher Rate;
高速沉积大面积均匀氢化非晶硅薄膜及其优异的光电特性的研究
18.
Structure and Properties of Hydrogenated Amorphous Silicon Thin Films by R.F and D.C Magnetron Sputtering
氢化非晶硅薄膜的直流和射频磁控溅射法制备及其表征