1.
Research on the Interference Nanosecond Laser Ablation of Micro-grating Structures on the Silicon Surface
硅表面微光栅结构的纳秒激光干涉刻蚀研究
2.
SiO_2/Si dry etching with XeF_2
XeF_2对SiO_2/Si的干法刻蚀
3.
Parameter Optimization Based on High-Aspect Ratio Si Dry Etching
基于高深宽比Si干法刻蚀参数优化
4.
Study of Dry Etching InP/InGaAs Based on Cl_2-based Gas
基于Cl_2基气体的InP/InGaAs干法刻蚀研究
5.
The principle and the main parameters of the dry etching for silicon dioxide are introduced.
阐述了二氧化矽干法蚀刻的原理和主要的蚀刻参数。
6.
Study on Laser Interferometric Lithography Technology Based on Multi-beam Interference;
基于多光束相干的激光干涉光刻技术研究
7.
etchings, woodcuts, lithographs;
蚀刻、木刻、平版画；
8.
An experimental double-beam and double-exposure interference photolithographic system has been established.
建立了双光束双曝光干涉光刻实验系统。
9.
Diffraction Spatial Imaging by Using the Technology of Consecutive Variable-pitch Dot Matrix Grating;
用于衍射空间成像的连续变空频干涉光刻技术
10.
Optical head supporting sub wavelength structure with UV interference lithography
支持亚波长结构光刻的紫外干涉光学头
11.
CMOS Compatible Thermopile Infrared Detector Released by Dry Etching;
CMOS兼容的干法刻蚀释放热电堆红外探测器
12.
ESC’s Influence to Production in Poly Etch and Methods to Improve ESC’s Lifetime
干法刻蚀中静电吸盘对产品良率的影响
13.
Abstract: Based on ash chamber of metal etch, this paper describes the full process of dry clean development and evaluation.
本文以金属刻蚀去胶腔为背景，简述干刻清洗工艺开发和评价过程。
14.
The research results show that IIL can get the high resolution more effectively than conventional optical lithography (OL).
研究结果表明，掩模投影成像干涉光刻技术比传统投影光刻能够得到更高的光刻分辨率。
15.
MONITORING INITIAL PITTING CORROSION OF 45 STEEL IN NaHCO_3-NaCl SOLUTION BY ESPI
利用电子散斑干涉技术研究45碳钢在NaHCO_3-NaCl体系中的早期点蚀行为
16.
gas discharge etching
气体放电蚀刻[法]
17.
laser engraving, laser etching
激光雕刻，激光蚀刻
18.
a block that has been etched or engraved.
一块被蚀刻或雕刻的板。