1.
Atmospheric-pressure Plasma Chemical Vapor Deposition for Polycrystalline Silicon Preparation from SiCl_4 and OES Diagnosis
由SiCl_4制备多晶硅的大气压等离子体化学气相沉积及发射光谱诊断
2.
plasma activated chemical vapour deposition
等离子体化学气相沉积
3.
Modification of silk fabric via atmospheric pressure plasma liquid deposition
丝织物的大气压等离子体液相沉积处理
4.
The Study of the Deposition of SiO_2 Films with RF Cold Plasma at Atmospheric-pressure;
常压射频低温等离子体增强化学气相沉积二氧化硅薄膜的研究
5.
Study of Porous Nanocrystalline TiO_2 Thin Film Deposited by Atmospheric Pressure Plasma-Enhanced Chemical Vapour Deposition
常压等离子体增强化学气相沉积纳米晶TiO_2多孔薄膜的研究
6.
SiO_x-like coating on cotton fabric by atmospheric pressure plasma
大气压等离子体沉积棉织物类氧化硅薄膜(英文)
7.
Diamond thin films grown up by microwave plasma CVD
微波等离子体化学气相沉积金刚石簿膜
8.
WORKING PRINCIPLE OF MICROWAVE PLASMA CVD SET UP
微波等离子体化学气相沉积装置的工作原理
9.
Study on Device of Magneto-active Plasma Enhanced Chemical Vapor Deposition;
磁激活等离子体增强化学气相沉积设备的研制
10.
The Study on DLC Films Deposited by PECVD;
等离子体增强化学气相沉积DLC膜的研究
11.
Study on device of magneto-active PECVD;
磁激活增强等离子体化学气相沉积设备的研制
12.
The Effect of Bias on Low Pressure Plasma-Enhanced Chemical Vapour Deposition of TiO_2 Film and its Structure and Performance
偏压对低气压等离子体增强化学气相沉积TiO_2薄膜的结构和性能的影响
13.
Study of Porous Nanocrystalline TiO_2 Thin Film Deposited by Atmospheric Pressure Plasma-enhanced Chemical Vapor Deposition;
常压等离子化学气相沉积纳米晶TiO_2多孔薄膜的研究
14.
TEM Study on Diamond Films Deposited by MPCVD;
微波等离子体化学气相沉积金刚石薄膜的电子显微学分析
15.
Study on Characteristic of Si_3N_4 Nanopowder Prepared by ICPECVD;
ICP等离子体增强化学气相沉积制备纳米粉体氮化硅特性研究
16.
ANALYSIS OF THE MORPHOLOGIES OF DIAMOND FILM GROWN BY MICROWAVE PLASMA CVD METHOD
微波等离子体化学气相沉积金刚石薄膜形貌分析
17.
NEW MICROWAVE PLASMA CVD SET UP FOR DIAMOND FILM GROWTH
新型微波等离子体化学气相沉积金刚石薄膜装置
18.
Research on High Quality Diamond Films in Microwave Plasma CVD;
微波等离子体化学气相沉积法制备高质量金刚石膜研究