1.
Hot cathode chemical vapor deposition method was established in order to deposit high-quality diamond films with high deposition rate.
为快速沉积高品质金刚石膜,建立了热阴极等离子体化学气相沉积方法.
2.
Preparation and Characterization of Carbon Nanotubes by Plasma-enhanced Chemical Vapor Deposition;
等离子体增强化学气相沉积方法制备碳纳米管及其表征
3.
Preparation of self-cleaning glass coated with TiO_2 on a float glass line by APCVD method
在线常压化学气相沉积方法制备TiO_2自洁薄膜玻璃(英文)
4.
Growth of ZnO Films on Different Substrates by Metal Organic Chemical Vapor Deposition
不同衬底上氧化锌薄膜的金属有机化学气相沉积方法生长(英文)
5.
Climate significance of continental special deposits
陆相特殊沉积的研究方法及气候意义
6.
Quantum chemistry methods and their applications to CVD reaction system
化学气相沉积反应研究的量子化学方法及应用
7.
The dry plating method is a method for deposition of a metal on the surface of polymer material under vacuum and includes sputtering method, vapor deposition, vacuum deposition, etc.
干镀是一种在真空下在聚合物表面沉积金属的方法，包括溅射、气相沉积、真空沉积等。
8.
Study on Restoring Strata Depositional Feature and Denuded Thickness of the Continental Petroliferous Basins
陆相含油气盆地地层沉积相与剥蚀厚度恢复方法研究
9.
The Praparation and Chemical Mechanism of Functional Graded Materials Using Metal Organic Chemistry Vapour Deposition;
金属有机化学气相沉积法制备功能梯度材料的方法和机理的研究
10.
Preparation of SiC Filament by Chemical Vapor Deposition;
化学气相沉积法制备钨芯SiC纤维
11.
Fabrication of Superconducting Magnesium Diboride Thin Film by Chemical Vapor Deposition;
化学气相沉积法制备MgB_2超导薄膜
12.
Research on the Preparation of Ultrafine Nickel Powder by Chemical Vapor Deposition
化学气相沉积法制备超细镍粉的研究
13.
The progress of Monte-Carlo simulation of the growth of thin films is reviewed.
综述了蒙特卡罗方法模拟物理气相沉积薄膜生长的研究进展。
14.
Preparation of Amorphous Silicon Nitride Film by ECRCVD;
用电子回旋共振化学气相沉积(ECRCVD)方法制备非晶态氮化硅薄膜
15.
The Preparation of Carbon Nanomaterials with Coal Gas as Carbon Feedstock via CVD Technique;
化学气相沉积法由煤气制备炭纳米材料的研究
16.
Deposition of Al_2O_3 Thin Films by Electrostatic Spray Assisted Vapor Deposition Method
静电辅助气溶胶化学气相沉积法制备Al_2O_3薄膜
17.
Deposition of Y_2O_3 thin films by electrostatic spray assisted vapor deposition method
静电辅助的气溶胶化学气相沉积法制备Y_2O_3薄膜
18.
plasma activated chemical vapour deposition
等离子体化学气相沉积