1.
Research on Optical Lithography Simulation and DFM for Nano-scale Circuits
纳米级电路光刻建模及可制造性设计研究
2.
Error Modeling of Scale Factor of Missile-borne
弹载开环光纤陀螺刻度因子误差建模
3.
Modeling and implementation of a virtual lithography system for micromachines
面向微加工的虚拟光刻系统建模与实现
4.
electron chrome mask
电子束光刻用铬掩模
5.
Thermal Deformation of EUV Mask and its Influence on Lithographic Performance;
极紫外光刻掩模热变形及其对光刻性能的影响
6.
An experimental double-beam and double-exposure interference photolithographic system has been established.
建立了双光束双曝光干涉光刻实验系统。
7.
Multilayer Dielectric Gratings: In-situ Monitoring of Duty Cycle of photoresist Mask and Ion-Beam-Etched Groove Depth;
介质膜光栅：光刻胶掩模占宽比和离子束刻蚀槽深的监控
8.
Fabrication of 2D Photonic Crystal Templates by Holographic Lithography and Soft Lithography;
基于全息光刻及软刻蚀技术制备二维光子晶体模板
9.
Improving the Profiles of Imaging Patterns by Optimizing Mask in DMD-Based Maskless Photolithography
优化掩模分布改善数字光刻图形轮廓
10.
The research results show that IIL can get the high resolution more effectively than conventional optical lithography (OL).
研究结果表明，掩模投影成像干涉光刻技术比传统投影光刻能够得到更高的光刻分辨率。
11.
Profile Control and Detection of Holographically Recorded Photoresist Grating Masks;
光刻胶全息光栅掩模槽形的控制和检测
12.
Method and Simulation of Micro Optical Elements Fabricated by Digital Lithography Technology;
数字光刻及其制作微光学元件的模拟研究
13.
Method of fabricating light guide plate template based on DMD micro-lithography
基于DMD微光刻的导光板模板的制作方法
14.
Simulation and experiments of monitoring curves on development of holographically recorded photoresist gratings
光刻胶全息光栅显影监测的模拟与实验
15.
laser engraving, laser etching
激光雕刻，激光蚀刻
16.
Carving surface modeling of images based on quadratic Bezier curved surface
基于二次Bezier曲面的图像雕刻型面建模
17.
Simulation and Model of Running Quality Parameters of Network-Attached Optical Disc Devices
附网光盘刻录设备运行品质参数模型与仿真
18.
Study on Micro Transfer Molding of Soft Lithography in Micro Total Analysis Systems;
微全分析系统中微传递成模软光刻技术研究