1.
PROCESS PARAMETERS DETERMINATION OF ETCHING LITHOGRAPHY SERVO DISK BY HF SPUTTERING
利用高频溅射刻蚀光刻伺服盘工艺参数的确定
2.
Effects of Post-Deposition Annealing on ZrW_2O_8 Thin Films by Radio Frequency Magnetron Sputtering
射频磁控溅射ZrW_2O_8薄膜的高温退火研究
3.
PWM High Frequency Power Supply for Ion Sputtering and the Design of it s Control System;
离子溅射用高频PWM电源及其控制系统设计
4.
Study on ZrW_2O_8 Films Prepared by Radio Frequency Magnetron Sputtering;
射频磁控溅射法合成ZrW_2O_8薄膜的研究
5.
Preparation of BN Films on Steels by Radio Frequency Magnetron Sputtering Method;
钢基表面射频磁控溅射法制备BN薄膜
6.
Computer Simulation of Thin Film Deposition by RF Magnetron Sputtering;
射频磁控溅射沉积薄膜的计算机模拟
7.
Computer Simulation of the Transportation and the Sputtering of Ions in RF Magnetron Sputtering;
射频磁控溅射镀膜过程中离子输运和溅射行为的模拟计算
8.
Electrochromic Performances of Nanosized Nickel Oxide Films Deposited by Mid-frequency Magnetron Sputtering
中频磁控溅射NiO_x电致变色薄膜(英文)
9.
Aluminum film was grown on modified fluorinated polymer composite films by rf magnetron sputtering.
采用射频磁控溅射技术在改性氟塑料表面沉积铝层，制备了金属／氟化高聚物复合薄膜。
10.
Si rich SiO2 films have been prepared by a rf magnetron sputter method.
用射频磁控溅射法制备了富硅二氧化硅薄膜。
11.
Study on Growth and N-type Doping of Cubic Boron Nitride Thin Films by RF Sputter;
立方氮化硼薄膜的射频溅射制备和掺杂研究
12.
Study on Properties of ZrW_2O_8 Thin Films Prepared by Radio Frequency Magnetron Sputtering;
射频磁控溅射法制备ZrW_2O_8薄膜及其性能研究
13.
Study on ZrW_2O_8、Al_2O_3 and Their Composite Films Prepared by Radio Frequency Magnetron Sputtering;
射频磁控溅射法制备ZrW_2O_8、Al_2O_3及其复合薄膜的研究
14.
Study on HfO_2 Thin Film by RF Magnetron Reactive Sputtering;
射频磁控反应溅射法制备HfO_2薄膜的研究
15.
Study on the Preparation and Properties of Diamond-like Carbon Films System by RF Magnetron Sputtering;
射频磁控溅射法制备类金刚石薄膜的研究
16.
Study on Y_2O_3 Thin Film by RF Magnetron Reactive Sputtering;
射频磁控反应溅射法制备Y_2O_3薄膜的研究
17.
The Study of Reactive Frequency Sputtering Prepared Electrochromic NiO_x Films;
反应性射频溅射制备电致变色NiO_x薄膜的研究
18.
Preparation and Characterization of VO_2 Thin Films by R.F Magnetron Sputtering;
VO_2薄膜的射频磁控溅射法制备及其特性研究