1.
plasma sputter combined etching
等离子溅射复合刻蚀
2.
Ti–Si–C–N Based Nanocomposite Coatings Produced by Plasma Enhanced Magnetron Sputter Deposition and its Erosion Resistance
等离子增强磁控溅射Ti–Si–C–N基纳米复合膜层耐冲蚀性能研究
3.
Research on array carbon nanotubes film without substrate by centrifugal infiltration and plasma etching
离心渗透等离子刻蚀法制备无基底阵列式碳纳米管复合膜
4.
The Study of the Etching Process with RF Cold Plasma at Atmospheric-pressure;
常压射频冷等离子体在刻蚀工艺中的应用研究
5.
Plasma Ablation Behavior of ZrC_P/W Composites
ZrC_P/W复合材料的等离子烧蚀行为
6.
Investigation of Inductively Coupled Fluorocarbon Plasma and Etching of SiO_2;
碳氟感应耦合等离子体及其SiO_2介质刻蚀研究
7.
Inductive Couple Plasmas Etching Processing of InSb Wafer
电感耦合等离子体刻蚀InSb芯片工艺的研究
8.
In situ Monitoring Etch Process and Endpoint for LSI by the Plasma Emission Spectroscopy
大规模集成电路刻蚀过程和终点的在线监测──等离子发射光谱法
9.
Study on movement of charged particles and etched profile on target surface during magnetron sputtering
磁控溅射带电粒子的运动分布以及靶面刻蚀形貌的研究
10.
Plasma emission spectra of ZnO and ZAO thin film grown by RF magnetron sputtering
ZnO和ZAO薄膜磁控溅射等离子体发射光谱
11.
NUMERICAL STUDIES ON ETCH PROFILES IN HIGH-DENSITY PLASMA;
高密度等离子体刻蚀轮廓的数值研究
12.
Investigation of Etching SiCOH Films by Dual-Frequency Capacitively Coupled Plasma
SiCOH薄膜的双频等离子体刻蚀研究
13.
PROCESS PARAMETERS DETERMINATION OF ETCHING LITHOGRAPHY SERVO DISK BY HF SPUTTERING
利用高频溅射刻蚀光刻伺服盘工艺参数的确定
14.
Modeling and Simulation for Inductively Coupled Plasma Etching of Silicon in MEMS Fabrications;
MEMS加工中电感耦合等离子体（ICP）刻蚀硅片的模型与模拟
15.
Study of Inductively Coupled Plasma Etch of InP and Fabrication of 14xxnm Pump Laser Diodes;
感应耦合等离子体刻蚀InP研究与14xxnm泵浦激光器制作
16.
Inductively coupled plasma reactive ion etching of InSb photovoltaic detector arrays
InSb阵列探测芯片的感应耦合等离子反应刻蚀研究
17.
Study on ion release of Ni from dental NiCr alloy by plasma magnetron reactive sputter deposition
牙科用镍铬合金表面等离子磁控溅射氮化钛膜对镍离子析出的影响
18.
Effects of plasma pretreatment on silver sputtering film deposited on PP nonwovens
等离子体预处理对丙纶基材溅射银薄膜的影响