1.
plasma chemical vapor deposition
等离子体化学汽相淀积
2.
plasma activated chemical vapour deposition
等离子体化学气相沉积
3.
photochemical vapor deposition oxide
光化学汽相淀积氧化物
4.
metallo organic chemical vapor deposition
有机金属化学汽相淀积
5.
cvd polysilicon
化学汽相淀积多晶硅
6.
modified chemical vapor deposition
改进的化学汽相淀积
7.
chemical vapor deposition reactor
化学汽相淀积反应器
8.
Diamond thin films grown up by microwave plasma CVD
微波等离子体化学气相沉积金刚石簿膜
9.
WORKING PRINCIPLE OF MICROWAVE PLASMA CVD SET UP
微波等离子体化学气相沉积装置的工作原理
10.
Study on Device of Magneto-active Plasma Enhanced Chemical Vapor Deposition;
磁激活等离子体增强化学气相沉积设备的研制
11.
The Study on DLC Films Deposited by PECVD;
等离子体增强化学气相沉积DLC膜的研究
12.
Study on device of magneto-active PECVD;
磁激活增强等离子体化学气相沉积设备的研制
13.
TEM Study on Diamond Films Deposited by MPCVD;
微波等离子体化学气相沉积金刚石薄膜的电子显微学分析
14.
Study on Characteristic of Si_3N_4 Nanopowder Prepared by ICPECVD;
ICP等离子体增强化学气相沉积制备纳米粉体氮化硅特性研究
15.
The Study of the Deposition of SiO_2 Films with RF Cold Plasma at Atmospheric-pressure;
常压射频低温等离子体增强化学气相沉积二氧化硅薄膜的研究
16.
Thermodynamic Study on CVD Tungsten Silicide System
化学气相淀积硅化钨体系热力学研究
17.
ANALYSIS OF THE MORPHOLOGIES OF DIAMOND FILM GROWN BY MICROWAVE PLASMA CVD METHOD
微波等离子体化学气相沉积金刚石薄膜形貌分析
18.
NEW MICROWAVE PLASMA CVD SET UP FOR DIAMOND FILM GROWTH
新型微波等离子体化学气相沉积金刚石薄膜装置