1.
photoresist controlled etch
光刻胶掩蔽控制腐蚀
2.
Profile Control and Detection of Holographically Recorded Photoresist Grating Masks;
光刻胶全息光栅掩模槽形的控制和检测
3.
Multilayer Dielectric Gratings: In-situ Monitoring of Duty Cycle of photoresist Mask and Ion-Beam-Etched Groove Depth;
介质膜光栅：光刻胶掩模占宽比和离子束刻蚀槽深的监控
4.
Study on Etch Selectivity Ratio of Masking Materials in Silicon Deep Etching
硅深刻蚀中掩蔽层材料刻蚀选择比的研究
5.
electron chrome mask
电子束光刻用铬掩模
6.
extra-fast no-screen film
特高速感光无屏蔽胶片
7.
Phase Shift Mask Monitor Scanner Focus;
利用相移光刻掩膜版监测光刻机台焦距
8.
Thermal Deformation of EUV Mask and its Influence on Lithographic Performance;
极紫外光刻掩模热变形及其对光刻性能的影响
9.
The Influences of Optimum Acidity Range by Masking Agent in Extraction Spectrometric Determination
掩蔽剂对萃取光度分析适宜酸度范围的影响
10.
Something that provides shelter.
掩护物提供掩蔽的事物
11.
Silicon Nitride Thin Film Deposited by PECVD as a Protecting Layer on Photolithography Mask
PECVD淀积Si_3N_4作为光刻掩膜版的保护膜
12.
Improving the Profiles of Imaging Patterns by Optimizing Mask in DMD-Based Maskless Photolithography
优化掩模分布改善数字光刻图形轮廓
13.
In darkness and in concealment, My house being now at rest.
无光无忧，拾级掩饰的暗梯--啊，真幸运--黑暗而隐蔽，我的寓所正在安息。
14.
The relationship between the absorbency and the dosages of developer, and of the masking agent has been investigated.
考察了显色剂用、掩蔽剂用量及显色时间与吸光度的关系。
15.
Research of SU-8 Resist Lithography Using Ultraviolet Laser;
紫外激光曝光光刻SU-8胶的工艺研究
16.
Design of Maskless Lithography Image System Based on DMD;
基于DMD的数字无掩模光刻成像系统设计
17.
The progressive blocking of light, radio waves, or other radiation from a celestial source during such a passage.
星掩在上述运行中，从一天体源发出的光，无线电波或其它射线被逐渐掩蔽
18.
The research results show that IIL can get the high resolution more effectively than conventional optical lithography (OL).
研究结果表明，掩模投影成像干涉光刻技术比传统投影光刻能够得到更高的光刻分辨率。