1.
cvd polysilicon
化学汽相淀积多晶硅
2.
photochemical vapor deposition oxide
光化学汽相淀积氧化物
3.
metallo organic chemical vapor deposition
有机金属化学汽相淀积
4.
plasma chemical vapor deposition
等离子体化学汽相淀积
5.
modified chemical vapor deposition
改进的化学汽相淀积
6.
chemical vapor deposition reactor
化学汽相淀积反应器
7.
Thermodynamic Study on CVD Tungsten Silicide System
化学气相淀积硅化钨体系热力学研究
8.
Deposition and Characteristics of Poly-silicon Films by Hot-wire CVD;
热丝化学气相沉积制备多晶硅薄膜的研究
9.
Atmospheric-pressure Plasma Chemical Vapor Deposition for Polycrystalline Silicon Preparation from SiCl_4 and OES Diagnosis
由SiCl_4制备多晶硅的大气压等离子体化学气相沉积及发射光谱诊断
10.
Growth of SiC Crystal by High Temperature Chemical Vaporous Deposition(HTCVD)
高温化学气相沉积法生长碳化硅晶体(HTCVD)
11.
Preparation of Amorphous Silicon Nitride Film by ECRCVD;
用电子回旋共振化学气相沉积(ECRCVD)方法制备非晶态氮化硅薄膜
12.
Fabrication of Silicon Inverse Opal Three-Dimensional Photonic Crystal Using Lpcvd/Template Techniques;
低压化学气相沉积/模板技术制备硅反蛋白石三维光子晶体
13.
dioxide polysilicon isolation
二氧化硅 多晶硅隔离
14.
This paper presents an overview of two new oxdizing techniques for laser-enhanced oxidation ard laser-induced chemical vapor deposition.
本文概述了激光增强氧化和激光诱导化学汽相淀积这两种新的氧化技术。
15.
Lectures and laboratory sessions focus on basic processing techniques such as diffusion, oxidation, photolithography, chemical vapor deposition, and more.
课堂讲授和实验课重点介绍了基本的工艺技术，如扩散、化、刻、学汽相淀积以及其它。
16.
Tentative Experiment of Synthesizing Single-Crystal Diamond Films by Chemical Vapor Deposition
化学气相沉淀法合成单晶金刚石膜实验探索
17.
Study of Porous Nanocrystalline TiO_2 Thin Film Deposited by Atmospheric Pressure Plasma-enhanced Chemical Vapor Deposition;
常压等离子化学气相沉积纳米晶TiO_2多孔薄膜的研究
18.
Study of Porous Nanocrystalline TiO_2 Thin Film Deposited by Atmospheric Pressure Plasma-Enhanced Chemical Vapour Deposition
常压等离子体增强化学气相沉积纳米晶TiO_2多孔薄膜的研究