1.
Process and Property of the ZrN Coating Made by Vacuum Arc Ion Plating
真空电弧离子镀ZrN涂层的工艺与性能
2.
Surface Properties and Fabrication of TiAlN Films Using Vacuum Arc Ion Plating with Separated Targets;
分离靶真空电弧离子镀制备TiAlN膜层及其性能研究
3.
Structure and mechanical properties of DLC films by pulsed vacuum arc ion deposition
脉冲真空电弧离子镀沉积类金刚石薄膜的结构和力学性能研究
4.
Multi-arc ion plating technique is using cool cathode with self-maintaining arc discharge as evaporation source.
多弧离子镀技术是一种在真空中将冷阴极自持弧光放电用于蒸发源的镀膜技术。
5.
Study on Macroparticles Reduction for Vacuum Cathodic Arc Source
真空阴极电弧离子镀层中宏观颗粒去除技术研究
6.
Fabrication of Ti-O Film by Vacuum Magnetic Filtered Arc Plasma Deposition and Its Blood Compatibility
真空磁过滤电弧离子镀制备氧化钛薄膜及其血液相容性
7.
Study on Microstructure and Properties of QTi2.5/Cu Films Prepared by Arc Ion Plating
电弧离子镀QTi2.5/Cu镀层组织与性能分析
8.
Microstructures of NiCoCrAlY Coating Deposited by Arc Ion Plating-a Transmission Electron Microscopy Study
电弧离子镀NiCoCrAlY涂层的透射电镜研究
9.
The principle and construction of the AC arc.
介绍了交流电弧离子镀的原理和结构。
10.
Study of CrSiN Film Deposited by Arc Ion Plating;
电弧离子镀CrSiN薄膜基本性能的研究
11.
Study of CrAlN Film Deposited by Pulsed Bias Arc Ion Plating;
脉冲偏压电弧离子镀CrAlN薄膜性能研究
12.
A Study on Preparation and Oxidation Resistance Property of CrAlTiN Film Deposited by Arc Ion Plating;
电弧离子镀CrAlTiN膜的制备与性能研究
13.
Fundamentals of Pulsed Bias Arc Ion Plating;
脉冲偏压电弧离子镀的工艺基础研究
14.
Study on Arc Ion Plating with Magnetron of Same Basic Component for Both Deposited Layer and the Substrate (QTi2.5／Cu)
QTi2.5/Cu同基合金磁控电弧离子镀研究
15.
Preparation and properties of CrN coating by arc ion deposition
电弧离子镀CrN涂层的制备及性能研究
16.
Preparation of Transparent (002) Preferential Orientation AlN Thin Film by Arc Ion Plating
电弧离子镀制备透明(002)AlN薄膜
17.
Investigations on the Characteristics of Arc Forms and Diagnosis of Plasma Parameters in VCB
真空开关电弧形态研究及其等离子体参数诊断
18.
Effect of N~+ Ion Beam Bombardment on the Properties of Arc-Ion-Plated TIN Films
氮离子束轰击对电弧离子镀TiN膜层的作用