1.
The E-beam Lithograpy Control System Based on VC++6.0
基于VC++6.0的电子束曝光控制系统
2.
Study on the Control System of Film Exposure Device of Medical X-ray Machine;
医用X射线机点片曝光装置控制系统研究
3.
Research on Control Strategy of Aeration Process in the Activated Sludge System;
活性污泥系统中曝气过程控制策略研究
4.
Fuzzy PID Control Technique on the Biologic Aeration System for Sewage Treatment;
污水生物曝气系统的模糊PID控制技术研究
5.
The Control System of Dissolved Oxygen in a Biological Aerated Filter in the Reclaimed Water System
中水回用曝气生物滤池溶解氧控制系统
6.
aperture-priority automatic exposure camera
光圈优先式曝光量自动控制照相机
7.
Cooling control of exposure frame. enhance accuracy of print circrit.
曝光台面恒温控制、保线路精准度。
8.
Total UV integrate sesor. Insure exposure volume.
全面紫外线积量感测、确控制曝光量。
9.
Total UV integrate sesor.Insure exposure volume.
全面紫外线积量感测、准确控制曝光量。
10.
An Exposure Control Algorithm in Adaptive Testing
一种自适应测试中曝光度的控制算法
11.
Film exposure control and maintenance of X-ray machine
普通X线机曝光控制原理及检修实例
12.
Design of the Control Circuit for CMOS Image Sensor and Study of the Exposure Timing Control;
CMOS图像传感器控制电路设计及曝光控制研究
13.
The control system consists of fuzzy controller, blast and aeration system, frequency control equipment and DO tester.
整个控制系统由模糊控制器、鼓风曝气系统、频调速装置和溶解氧测试仪组成。
14.
An experimental double-beam and double-exposure interference photolithographic system has been established.
建立了双光束双曝光干涉光刻实验系统。
15.
Measurement System of Precision Stage for E-Beam Aligner
电子束曝光系统中精密工件台的测量系统
16.
Research on the distribution of ultraviolet irradiance in an integral stereolithography system
面曝光快速成形系统中紫外光辐照度分布研究
17.
This paper deals mainly with the operationof a trapezoidal controller and the exposure procedure of a trapezoidal pattern, by the way the exposure of a rectangular pattern is described first.
本文先简要叙述矩形曝光的控制,然后着重介绍梯形控制器的工作原理以及梯形的曝光过程。
18.
E-beam Lithography Stage Controller Design Based on FPGA
基于FPGA的电子束曝光机工件台控制器设计