1.
Doping- The process of the donation of an electron or hole to the conduction process by a dopant.
掺杂-把搀杂剂掺入半导体，通常通过扩散或离子注入工艺实现。
2.
Simulation on the Effect of Punchthrough Stop Implantation Process Deviation on the Performance of NMOSFET Device;
抗穿通离子注入工艺偏差对NMOSFET器件性能影响的研究
3.
Abstract: This paper introduces the application and development of ion plating, ionodialysis, ion implantation and the compound technology.
文摘:介绍了离子镀、离子渗、离子注入及其复合工艺的应用与发展。
4.
implant masking step
离子注入用掩蔽工序
5.
mos ion implantation
mos结构离子注入
6.
The Study of Surface Modification by Ti/Nb Ion Implantation into Mould Steels;
Ti、Nb离子注入工模具钢表面改性研究
7.
Fabrication of micro/nano structures using focused ion beam implantation technology
基于聚焦离子束注入的微纳加工技术研究
8.
The Influence of Nitrogen Plasma Ion Immersion Implantation and Artifical Aging on The Mechanical Properties of LC4 Aluminum Alloy
氮等离子体浸没离子注入及人工时效对LC4铝合金机械性能的影响
9.
bipolar ion implantation
双极型掐用离子注入
10.
high output implanter
高功率离子注入装置
11.
rod plasma injector
棒状等离子体注入器
12.
ion implantation gate MOS integrated circuit
离子注入ＭＯＳ集成电路
13.
ion implanted fet
离子注入场效应晶体管
14.
ion implanted base transistor
离子注入基极晶体管
15.
amorphous implantation
对非晶半导体离子注入
16.
Research on Mo+C Implantation into TiN Film by Multi-arc Ion Plating
Mo+C离子注入多弧离子镀TiN薄膜研究
17.
Boron-Neutron decay logging includes boric acid injection technology and logging operations.
注硼中子寿命测井工艺包括注硼施工工艺和测井施工工艺2部分。
18.
An ion-implanted titanium alloy hip joint.( Image courtesy of Oak Ridge National Laboratory.
（译注：在人工关节的钛合金金属表面植入离子〈常为氮离子〉增加人工关节的硬度，减少磨损。