1.
PROCESS PARAMETERS DETERMINATION OF ETCHING LITHOGRAPHY SERVO DISK BY HF SPUTTERING
利用高频溅射刻蚀光刻伺服盘工艺参数的确定
2.
plasma sputter combined etching
等离子溅射复合刻蚀
3.
Simulation Study of the Sputtering Yield and the Target Erosion on the Magnetron Sputtering Process;
磁控溅射过程中溅射产额及靶材刻蚀的模拟计算研究
4.
The selective etching of the evaporated or squeezed layers is a critical step in preserving yield.
蒸发层和溅射层的选择刻蚀是保证成品的关键步骤。
5.
Study on movement of charged particles and etched profile on target surface during magnetron sputtering
磁控溅射带电粒子的运动分布以及靶面刻蚀形貌的研究
6.
Preparation of TiAlCrN Hard Coatings by Reactive Magnetron Co-Sputtering and Their Corrosion Resistance
磁控溅射制备TiAlCrN硬质薄膜及其抗腐蚀性能
7.
Hot corrosion resistance of a sputtered Ni-16Co-26Cr-10Al nanocrystalline coating in molten salts
溅射Ni-16Co-26Cr-10Al纳米晶涂层的熔盐热腐蚀性能
8.
Research of Wear Resistance and Corrosion Resistance with TiN Multi-permeation Layer Formed by Reactive Sputtering;
反应溅射形成氮化钛复合渗镀层耐磨耐腐蚀性能的研究
9.
Research on the Corrosion Resistance of Magnetic Refrigerant Material Gd Sputtered Protective Coatings;
磁致冷材料Gd表面磁控溅射薄膜耐腐蚀性能研究
10.
Effect of Bias Voltage on Micromorphology and Corrosion Resistance of Pure Cr Coating Deposited by Magnetron Sputtering
偏压对磁控溅射纯Cr镀层组织形貌及耐腐蚀性能的影响
11.
Ti–Si–C–N Based Nanocomposite Coatings Produced by Plasma Enhanced Magnetron Sputter Deposition and its Erosion Resistance
等离子增强磁控溅射Ti–Si–C–N基纳米复合膜层耐冲蚀性能研究
12.
etchings, woodcuts, lithographs;
蚀刻、木刻、平版画；
13.
Fabrication of 128×128 Area Silicon Field Emission Arrays Using Ar Ion Beam Etching
128×128元硅场发射阵列的氩离子束刻蚀制作
14.
The Study of the Etching Process with RF Cold Plasma at Atmospheric-pressure;
常压射频冷等离子体在刻蚀工艺中的应用研究
15.
Dynamic Caustics and Shadow Rendering Based on Radiance Transfer Field;
基于预计算辐射传输场的动态蚀刻与阴影绘制
16.
sputtered film disk
溅射膜盘 -全称 :溅射薄膜磁盘
17.
gas discharge etching
气体放电蚀刻[法]
18.
laser engraving, laser etching
激光雕刻，激光蚀刻