1.
Development of a High ThermoStability UV Positive Photoresist and a 248nm Deep-UV Photoresist;
耐高温紫外正型光刻胶和248nm深紫外光刻胶的研制
2.
Study of a UV Positive Photoresist and Photoacid Generators for 248nm Deep-UV Photoresist;
紫外正型光刻胶及248nm产酸剂的研制
3.
Research of SU-8 Resist Lithography Using Ultraviolet Laser;
紫外激光曝光光刻SU-8胶的工艺研究
4.
Research on Theory and Experiment of UV-Lithography on SU-8 Photoresist;
SU-8胶紫外光刻理论与实验研究
5.
Optical Constants of Film Materials for Deep Ultraviolet/Ultraviblet
深紫外/紫外薄膜材料的光学常数研究
6.
Research of Focus Optical System Used in Ultraviolet Photolithography;
用于紫外光刻的聚焦光学系统的研究
7.
Study on Key Technologies in UV-LED Fiber Lithography System
紫外LED光纤光刻系统关键技术研究
8.
Thermal Deformation of EUV Mask and its Influence on Lithographic Performance;
极紫外光刻掩模热变形及其对光刻性能的影响
9.
The two-handed UV Lamp dries all UV topcoats, gels, and acrylics.
(双手紫外灯可光疗紫外表层剂凝胶和水晶甲。
10.
Investigation on Extreme Ultraviolet Lithography;
极紫外投影光刻中若干关键技术研究
11.
Optical properties of vacuum ultraviolet and deep ultraviolet region substrate materials
真空紫外到深紫外波段基底材料的光学特性
12.
Photoconductive UV Sensor Based on ZnO Films Prepared by Sol-Gel Method
溶胶-凝胶法制备ZnO薄膜光电导紫外光敏器件
13.
The dots are applied with a liquid adhesive containing a uv trace.
这些点上涂了紫外感光的液体粘胶
14.
Two-mirror system design study of reduced projection optics for EUV Lithography;
极紫外投影光刻两镜微缩投影系统的光学设计
15.
Optical head supporting sub wavelength structure with UV interference lithography
支持亚波长结构光刻的紫外干涉光学头
16.
Numerical analysis and measurement of stray light from UV ruled gratings
紫外平面刻划光栅杂散光数值分析及测试
17.
Study of Diode-pumped All-solid-state Deep Ultraviolet Laser at 213nm;
LD泵浦全固态213nm深紫外激光器的研究
18.
Optical constants of fluoride films in the DUV range
氟化物材料在深紫外波段的光学常数