1.
Microstructure and Magnetic Properties of CoFe_2O_4 Films Synthesized by RF Sputtering Method
射频溅射法制备的CoFe_2O_4薄膜结构及磁性能
2.
Deposition of Tungsten Disulfide Films Grown by RF Magnetron Sputtering on Stainless Steel Substrates
射频溅射法制备硫化钨固体润滑薄膜的研究
3.
Study on ZrW_2O_8 Films Prepared by Radio Frequency Magnetron Sputtering;
射频磁控溅射法合成ZrW_2O_8薄膜的研究
4.
Preparation of BN Films on Steels by Radio Frequency Magnetron Sputtering Method;
钢基表面射频磁控溅射法制备BN薄膜
5.
Si rich SiO2 films have been prepared by a rf magnetron sputter method.
用射频磁控溅射法制备了富硅二氧化硅薄膜。
6.
Study on Properties of ZrW_2O_8 Thin Films Prepared by Radio Frequency Magnetron Sputtering;
射频磁控溅射法制备ZrW_2O_8薄膜及其性能研究
7.
Study on ZrW_2O_8、Al_2O_3 and Their Composite Films Prepared by Radio Frequency Magnetron Sputtering;
射频磁控溅射法制备ZrW_2O_8、Al_2O_3及其复合薄膜的研究
8.
Study on HfO_2 Thin Film by RF Magnetron Reactive Sputtering;
射频磁控反应溅射法制备HfO_2薄膜的研究
9.
Study on the Preparation and Properties of Diamond-like Carbon Films System by RF Magnetron Sputtering;
射频磁控溅射法制备类金刚石薄膜的研究
10.
Study on Y_2O_3 Thin Film by RF Magnetron Reactive Sputtering;
射频磁控反应溅射法制备Y_2O_3薄膜的研究
11.
Preparation and Characterization of VO_2 Thin Films by R.F Magnetron Sputtering;
VO_2薄膜的射频磁控溅射法制备及其特性研究
12.
Cd_(1-x)Zn_xTe alloy films grown by r.f.sputtering
射频磁控溅射法制备Cd_(1-x)Zn_xTe薄膜(英文)
13.
Study of high-quality thick GaN films grown on RF-ZnO buffer by hydride vapoar phase epitaxy
射频溅射ZnO作缓冲层的HVPE法生长GaN厚膜
14.
Preparation and Performance Study of Polyfluorin Thin Film by Radio Frequency Magnetron Sputtering Method
射频磁控溅射法制备聚氟薄膜及其性能研究
15.
Computer Simulation of Thin Film Deposition by RF Magnetron Sputtering;
射频磁控溅射沉积薄膜的计算机模拟
16.
Effects of Post-Deposition Annealing on ZrW_2O_8 Thin Films by Radio Frequency Magnetron Sputtering
射频磁控溅射ZrW_2O_8薄膜的高温退火研究
17.
The Preparation of ZnO:Al Thin Films Deposited on Glass Substrate by R.F. Magnetron Sputtering and the Characterization of Their Structure and Properties;
玻璃基ZnO:Al薄膜的射频磁控溅射法制备及其结构和性能表征
18.
The Study on the Microstructure and Properties of Al_2O_3 Thin Films Prepared by Radio Frequency Reactive Magnetron Sputtering;
射频反应磁控溅射法制备Al_2O_3薄膜结构与性能的研究