1.
Raman Spectra Analysis of Bromine Doped Hydrogenated Amorphous Carbon (a-C∶Br∶H) Films Deposited by RF-PECVD
RF-PECVD掺溴非晶碳氢膜的Raman光谱分析
2.
Study on the Erosion Process of Amorphous Hydrocarbon Films with Retarding Field Analyzer
非晶碳氢膜刻蚀率与离子能量分布函数关系的研究
3.
Influence of Temperature on the Morphologies and Mechanical Properties of the Diamond-Like Carbon Films Deposited by MF Magnetron Sputtering
沉积温度对中频磁控溅射制备含氢非晶碳膜表面形貌和力学性能的影响
4.
Research Progress on the Hydrogen Content Control of Hydrogenated Amorphous Silicon Thin Films
氢化非晶硅薄膜H含量控制研究进展
5.
Experimental Study of Internal Friction of a-Si:H Films Charged with Hydrogen
氢化非晶态硅薄膜的渗氢内耗实验研究
6.
Studies on Preparation by HFCVD and Wettability of Amorphous Carbon Films;
HFCVD制备非晶碳薄膜及其润湿性的研究
7.
The Preparation and Properties Research of Fluorinated Amorphous Carbon Films;
氟化非晶态碳膜的制备及其性能研究
8.
Blood-compatibility of La_2O_3 Doped Amorphous Carbon Film
氧化镧掺杂非晶碳薄膜的血液相容性
9.
Growth and Characterization of Amorphous Fluorinated Carbon Films by Inductively Coupled Plasma Chemical Vapor Deposition
ICP-CVD制备氟化非晶碳(a-C:F)薄膜的研究
10.
Influence of Hydrogen Flow on Grain Size of Nano-Crystalline Sic Films Grown by HFCVD Method
HFCVD法制备纳米晶体碳化硅薄膜中氢流量对晶粒尺寸的影响
11.
Study of a-Si:H Microstructure by MWECR CVD Technique;
MWECR CVD制备氢化非晶硅薄膜的微结构研究
12.
Study of Photoelectric Properties of a-Si:H Deposited by MW-ECR CVD;
MW-ECR CVD制备氢化非晶硅薄膜之光电特性研究
13.
Fabrication of Hydrogenarated Amorphous Silicon Thin Films by PECVD and the Study of Metal Induced Crystallization;
PECVD法制备氢化非晶硅薄膜及其金属诱导晶化研究
14.
Microstructure and Mechanical Properties of Amorphous Carbon Nitride Thin Films;
非晶态碳氮薄膜的微观结构与力学性质
15.
Influence of Deposition Temperature on the Structure & Properties of a-C: F Films;
沉积温度对氟化非晶碳薄膜结构和性质的影响
16.
Preparation of Super-hard Amorphous Carbon Film by Pulsed Laser Ablating Graphite Target;
脉冲激光烧蚀石墨靶制备超硬非晶碳膜
17.
Thermal Annealing Effects on the Optical Properties of Amorphous Silicon Carbide Films;
非晶碳化硅薄膜光学特性的热退火效应
18.
Electrical Properties of Nitrogen Doping Fluorinated Amorphous Carbon Thin Films;
含氮氟化非晶碳(a-C∶F∶N)薄膜电学性能的研究