1.
Investigation on ECR Plasma Deposition and Dielectric Property of SiCOH Low-k Films;
SiCOH低k薄膜的ECR等离子体沉积与介电性能研究
2.
Thermal stability of structure and properties of CH_x doped SiCOH low dielectric constant films
CH_x掺杂SiCOH低介电常数薄膜的物性热稳定性分析
3.
Investigation on Low-κ SiCOH Films Prepared by ECR-CVD and the Influence of Fluorine Incorporation;
SiCOH低κ薄膜的ECR等离子体制备及F掺杂效应研究
4.
Deposition of O-doped SiCOH Films and Investigation of Properties;
氧掺杂SiCOH薄膜的制备和性能研究
5.
Deposition of CH_4-doped SiCOH Films and Investigation of Properties;
甲烷掺杂SiCOH薄膜的制备和性能研究
6.
Effect of CHF_3 Plasma Treatment on Characteristics of SiCOH Films
CHF_3等离子体处理对SiCOH薄膜性能的影响
7.
Investigation of Etching SiCOH Films by Dual-Frequency Capacitively Coupled Plasma
SiCOH薄膜的双频等离子体刻蚀研究
8.
Investigation of Plasma Chemistry in the Deposition of F-doped SiCOH Films;
氟掺杂SiCOH薄膜沉积的等离子体化学特性研究
9.
Effect of Annealing on Structures and Properties of CH_4-doped SiCOH Films;
热处理对掺CH_4的SiCOH薄膜结构及性能的影响
10.
Effect of CHF_3/DMCPS ratio on structure and properties of F doping SiCOH low-k films deposited by ECR plasma
CHF_3/DMCPS比对F掺杂SiCOH薄膜结构及性能的影响(英文)
11.
The Research of the Structure and Electrical Property of the Porous Low k SiO_2: F Film;
多孔低k SiO_2：F薄膜的结构和电学性质研究
12.
Research on the Fabrication of High-k Dielectric Films and the Discussion of Integrated Thin Film Capacitor;
高k电介质薄膜制备研究与集成薄膜电容探讨
13.
Preparation and Dielectric Tunability of K Doped PST Ferroelectric Film
K掺杂PST薄膜的制备与介电调谐性能
14.
LDPE & HDPE sheet & bag
高低密度聚乙烯薄膜及薄膜袋
15.
low-temperature thin film NiCr thermometer
低温镍铬薄膜温度计
16.
Growth Behavior and Stability of High k ZrO_2-based Films;
高k-ZrO_2基薄膜生长行为及其稳定性的研究
17.
Research on Preparation and Properties of Tantalum Oxide High-K Films;
氧化钽高K薄膜的制备、结构和光、电性能的研究
18.
Preparation and Structure of HfSi_xO_y Thin Film for High K Gate Dielectrics
高K栅介质HfSi_xO_y薄膜的制备工艺与结构分析