说明:双击或选中下面任意单词,将显示该词的音标、读音、翻译等;选中中文或多个词,将显示翻译。
您的位置:首页 -> 句库 -> 闭合场非平衡磁控溅射
1.
Software Design of Real-time Monitoring System of Unbalanced Magnetron Sputtering Ion-plating Equipment in Closed Field;
闭合场非平衡磁控溅射离子镀装备实时监控系统软件设计
2.
Study on Microstructure and Properties of CrAlN Coatings Deposited by Closed Field Unbalanced Megnetron Sputtering
闭合场非平衡磁控溅射沉积的CrAlN薄膜组织结构和性能研究
3.
Design, Manufacture and Application of an Unbalance and Close Magnetron Sputtering Equipment;
非平衡闭合磁场磁控溅射设备的设计、制造及应用
4.
Bias Voltage and Mechanical Properties of CrN Coatings Deposited by Closed Field Unbalanced Magnetron Sputtering
封闭磁场非平衡磁控溅射偏压对CrN镀层摩擦学性能影响
5.
Influence of unbalanced coefficient of magnetron and closed-state of magnertic field on plating Cr coating using a sputtering ion plating system
非平衡度和闭合状态对磁控溅射离子镀过程的影响
6.
Study of MoS_2-Ti Composite Coatings Deposited by Unbalanced Magnetron Sputtering;
非平衡磁控溅射沉积MoS_2-Ti复合薄膜研究
7.
Study on NiCoCrAlY Coating Using Unbalanced Magnetron Sputtering on Titanium Alloy Surface
钛合金表面非平衡磁控溅射沉积NiCoCrAlY涂层
8.
Effects of the Magnetic Field Unbalance Coefficient on Deposition Process of Magnetron Sputtered Cr Coating;
磁场非平衡度对磁控溅射Cr镀层沉积过程的影响
9.
Studies on Discharge Characteristics and Applications of ICP Enhanced Unbalanced Magnetron Sputtering in Cusp-field Confined Magnetron;
会切场约束ICP增强非平衡磁控溅射放电及应用研究
10.
Effect of the background vacuum degree on the properties of the C/Cr coating deposited by non-equilibrium magnetron sputtering
本底真空度对非平衡磁控溅射C/Cr复合镀层性能的影响
11.
Studies in the Technologies for the a-C:H Films Prepared by Middle Frequency Unbalanced Magnetron Sputtering;
中频非平衡磁控溅射制备DLC膜的工艺研究
12.
Analysis of Structure of Cr-doped GLC Coatings Deposited by Unbalanced Magnetron Sputtering
非平衡磁控溅射掺Cr类石墨镀层的结构分析
13.
Microstructures and Properties of Silicon Nitride Films Grown by Unbalanced Magnetron Sputtering
非平衡磁控溅射制备氮化硅薄膜及其性能研究
14.
Influence of oxidation temperature on microstructure and properties of unbalanced magnetron sputtered TiN coatings
热氧化温度对非平衡磁控溅射TiN镀层的影响
15.
Study on Effect of Cr Coating Deposition Process by the Closed State of Magnetic Field in Magnetron Sputtering;
磁场的闭合状态对磁控溅射Cr镀层沉积过程影响的研究
16.
Study of Controlling and Simulation of Hysteresis Effect by PID Neural Network Method in Unbalanced Reactive Magnetron Sputtering
非平衡反应磁控溅射迟滞效应的PID神经网络控制仿真研究
17.
Study of Structure and Tribological Properties in Vacuum of MoS_2-Ti Composite Coatings Deposited by Unbalanced Magnetron Sputtering system
非平衡磁控溅射沉积MoS_2-Ti复合薄膜的结构与真空摩擦磨损性能研究
18.
Study of Structure and Performance of Unbalanced Magnetron Sputtering MoS_2-Ti Coating Affected by Deposition Pressure
沉积压力对非平衡磁控溅射沉积MoS_2-Ti复合薄膜的结构与性能影响研究