1.
Computer Simulation of Thin Film Deposition by RF Magnetron Sputtering;
射频磁控溅射沉积薄膜的计算机模拟
2.
The Application of Sputtering Deposition Technique of TiC to Cutters
溅射沉积碳化钛技术在刀具上的应用
3.
Investigation of High Dielectric Ta_2O_5 Thin Films Deposited by Reactive Sputtering;
反应溅射沉积高介电Ta_2O_5薄膜研究
4.
Preparation of NiO thin films by DC sputtering and structure characterization
直流溅射沉积氧化镍薄膜及结构表征
5.
Reflectance of Ir Layer in Vacuum Ultraviolet Wavelength Region Deposited by Ion Beam Sputtering
离子束溅射沉积Ir膜真空紫外反射特性研究
6.
Study of MoS_2-Ti Composite Coatings Deposited by Unbalanced Magnetron Sputtering;
非平衡磁控溅射沉积MoS_2-Ti复合薄膜研究
7.
Study on SiO_x Coating Deposition by Magnetron Sputtering with Ion Beam Assisted;
离子源辅助磁控溅射沉积SiO_x阻隔薄膜的研究
8.
Characterization and Texture of Magnetron Sputtered Ag Thin Films After Annealing;
磁控溅射沉积银薄膜退火织构及其表征
9.
Study on NiCoCrAlY Coating Using Unbalanced Magnetron Sputtering on Titanium Alloy Surface
钛合金表面非平衡磁控溅射沉积NiCoCrAlY涂层
10.
Growth and Mechanical Properties of Stainless Steel Thin Films Prepared by DC Magnetron Sputtering on Al Alloy Foil
铝表面磁控溅射沉积不锈钢薄膜及其性能
11.
Study of deposition and properties of aluminum nitride thin films by mediate frequency pulsed magnetron sputtering
中频脉冲磁控溅射沉积氮化铝薄膜及性能研究
12.
Effects of power supply mode on deposition rate in middle-frequency magnetron sputtering
电源工作模式对中频磁控溅射沉积速率的影响
13.
Discharge Properties of Unbalanced Magnetron Sputtering System and Application of TiN_x Films Deposition;
非平衡磁控溅射沉积系统放电特性和沉积TiN_x薄膜应用研究
14.
Effects of deposition parameters on deposition rate of B-C-N film prepared by magnetron sputtering
磁控溅射沉积参数对硼碳氮薄膜沉积速率的影响
15.
Copper films on flexible PI subtrate prepared by roll magnetron sputtering
卷绕式磁控溅射法沉积PI-Cu膜
16.
Deposition rate is increase quickly with sputtering power.
结果表明溅射功率对沉积速率的影响最大，随溅射功率的增大沉积速率快速增大。
17.
Improvement of CdO Thin Films Deposited by DC Magnetron Sputtering;
磁控溅射法沉积透明导电CdO薄膜的性能优化
18.
Preparation of Uranium Film by Ultra High Vacuum Magnetron Sputtering and Its Characterization
超高真空磁控溅射法沉积铀薄膜及其表面状态