1.
Thermal Deformation of EUV Mask and its Influence on Lithographic Performance;
极紫外光刻掩模热变形及其对光刻性能的影响
2.
Research on Capability of CD-R and Carve-recording Skill
光盘刻录机的性能与刻录技巧的研究
3.
Study on the Properties of SL5510 Type Photosensitive Resin for Stereolithography
立体光刻快速成形SL5510型光敏树脂性能研究
4.
Fabrication and Characterization of General Microcups with Flexibility and Solvent-resistance by UV Photo-mask Lithography
掩膜光刻法制备柔性抗蚀电子纸微杯及其性能表征
5.
Optical properties and process of the diluted SU8 resist
改性SU8光刻胶的光学特性及其工艺
6.
Study on Molecular Design and Property of Fluorine-Containing Polyester and Photoresist for Optical Waveguide;
含氟聚酯和光刻胶波导材料的分子设计与性能研究
7.
Norbornene-Based High Transparency Polymer Applied to 193nm Lithography: Synthesis and Properties
降冰片烯基193nm光刻技术用高透明聚合物的合成与性能研究
8.
Systematic Control Exploitation for Critical Dimension and Overlay in Photolithography Technology
光刻工艺中对线宽和套刻系统性控制的开发
9.
Enhanced Photoelectrochemical Performance of WO_3 Film Electrode under Visible Light by Electrochemical Etching Fluorination in Aqueous Solutions Containing Fluorine
含氟水溶液中电化学刻蚀氟化WO_3薄膜电极增强可见光光电化学性能
10.
This photoresist have thermal stabilityand high resolution.
该光刻胶具有热稳定性和高分辨率性。
11.
The research results show that IIL can get the high resolution more effectively than conventional optical lithography (OL).
研究结果表明，掩模投影成像干涉光刻技术比传统投影光刻能够得到更高的光刻分辨率。
12.
Sun Co. logo-not very impressive
阳光公司标识语-不能给人深刻印象
13.
laser engraving, laser etching
激光雕刻，激光蚀刻
14.
Study of Image Processing of Laser Engraving Based on Hollow Optical Fiber;
传能光纤激光雕刻机图像处理技术的研究
15.
Design for the Stucture of Laser Carving System Applied with Transmitting Energy Fiber;
应用传能光纤激光雕刻系统的结构设计
16.
Research on Image Processing for Lasser Carving System of Transmitting Energe Fiber
传能光纤激光雕刻系统图像处理的研究
17.
Litho-Rule Checking Insertion into DFM Flow
用在可制造性设计中的光刻规则检查
18.
Surface Modification and Etching of Polymer by Excimer Laser Irradiation;
聚合物材料表面激光改性与刻蚀研究