1.
Research of Focus Optical System Used in Ultraviolet Photolithography;
用于紫外光刻的聚焦光学系统的研究
2.
Development of a High ThermoStability UV Positive Photoresist and a 248nm Deep-UV Photoresist;
耐高温紫外正型光刻胶和248nm深紫外光刻胶的研制
3.
Thermal Deformation of EUV Mask and its Influence on Lithographic Performance;
极紫外光刻掩模热变形及其对光刻性能的影响
4.
Research on Theory and Experiment of UV-Lithography on SU-8 Photoresist;
SU-8胶紫外光刻理论与实验研究
5.
Research on Precise Mechanism and Related Control Technologies of Euvl Stage;
极紫外光刻机工件台精密机械及控制相关技术
6.
Research of SU-8 Resist Lithography Using Ultraviolet Laser;
紫外激光曝光光刻SU-8胶的工艺研究
7.
Study on Key Technologies in UV-LED Fiber Lithography System
紫外LED光纤光刻系统关键技术研究
8.
Investigation on Extreme Ultraviolet Lithography;
极紫外投影光刻中若干关键技术研究
9.
Study of a UV Positive Photoresist and Photoacid Generators for 248nm Deep-UV Photoresist;
紫外正型光刻胶及248nm产酸剂的研制
10.
Two-mirror system design study of reduced projection optics for EUV Lithography;
极紫外投影光刻两镜微缩投影系统的光学设计
11.
Optical head supporting sub wavelength structure with UV interference lithography
支持亚波长结构光刻的紫外干涉光学头
12.
Numerical analysis and measurement of stray light from UV ruled gratings
紫外平面刻划光栅杂散光数值分析及测试
13.
Ultraviolet light or the ultraviolet part of the spectrum.
紫外光，紫外线的紫外光或光谱的紫外线部分
14.
Vacuum-ultraviolet Blazed Silicon Gratings Anisotropically Wet-etched by a Native-oxide Mask
利用天然氧化层掩模的真空紫外硅闪耀光栅的湿法刻蚀制作
15.
UV-visible spectrophotometer
紫外-可见光分光光度计
16.
ultra-violet and visible spectrophotometer
紫外可见光分光光度计
17.
ultraviolet spectrophotometry
紫外线分光光度测定法
18.
ultraviolet absorption spectrophotometry
紫外吸收分光光度学