1.
STUDY ON THE HIGH SPEED JET ELECTRODEPOSITION OF NANO-CRYSTALLINE BULK NICKEL AND THEIR MICRO-STRUCTURE;
纳米晶块体镍的喷射高速电沉积及其微观结构研究
2.
High rate growth and electronic property of μc-Si∶H
微晶硅薄膜高速沉积及电学性质的研究
3.
Investigation on Preparing an Even Large Area and Excellent Optoelectric Properties Hydrogenated Amorphous Silicon Film with Higher Rate;
高速沉积大面积均匀氢化非晶硅薄膜及其优异的光电特性的研究
4.
Study on high growth-rate deposition of nanocrystalline silicon thin film with VHF-PECVD
甚高频放电加速纳米硅薄膜沉积速度的机理研究
5.
MECHANISM AND KINETICS OF ELECTROPHORETIC DEPOSITION (EPD) OF YTTRIA-STABILIZED ZIRCONIA (YSZ) FILM
电泳沉积法制备固体电解质薄膜的沉积速率和沉积机理
6.
The process features simple operation, wide operating range, high current efficiency and fast deposition speed.
该工艺操作简单,工艺范围宽,电流效率高,沉积速度快。
7.
N-type window layer and its application in high deposition rate microcrystalline silicon solar cells
n型窗口层材料及其在高速沉积微晶硅太阳电池中的应用研究
8.
Optimization of high rate growth high quality μc-Si:H thin films and its application to the solar cells
高速沉积本征微晶硅的优化及其在太阳电池中的应用
9.
Application of the transition zone p layer in amorphous silicon thin film solar cells with high deposition rate
过渡区p层在高速沉积非晶硅薄膜电池中的应用
10.
Factors Affecting the Deposition Rate of Poised Electro-Brush Plated Nickel Coating
脉冲电刷镀镍中沉积速度的影响因素
11.
An optical emission spectroscopy study on the high rate growth of microcrystalline silicon films
高速沉积微晶硅薄膜光发射谱的研究
12.
Influences of deposition temperature and rate on mechanical stress of electron beam deposited ZnSe thin films
沉积温度和速率对电子束沉积ZnSe薄膜应力特性的影响
13.
Investigation of High Dielectric Ta_2O_5 Thin Films Deposited by Reactive Sputtering;
反应溅射沉积高介电Ta_2O_5薄膜研究
14.
The Research and Application of Control System for Rapid Prototyping by Electro-deposition with Electrolytes Jet;
射流电沉积快速成形控制系统的研究与应用
15.
The Forming Character of Electron Beam Freeform Fabrication
电子束熔丝沉积快速制造的成型与组织特征
16.
Preparation of Anode Head of Numerical-control Selective Electrodeposition Rapid Prototyping
数控选区电沉积快速成型阳极头的制备
17.
Investigation of numerical selective electrodeposition rapid prototyping
数控选区电化学沉积快速成型技术研究
18.
Exploration of the Feasibility to Conduct High-Speed Chromium Electrodeposition in Trivalent Chromium Sulfate Solution
三价铬硫酸盐体系快速电沉积可行性探讨