1.
Study on CMP Nano-Slurry and Technology;
CMP纳米抛光液及抛光工艺相关技术研究
2.
A Reaserch of the Principle of Nano-Processing Nano-Processing Experiment of Ice Desk Polishing on Metal Materials;
金属材料冰盘抛光纳米加工机理研究
3.
Preparation of nano-sized CeO_2 and its polishing performances
纳米氧化铈的制备及其抛光性能的研究
4.
Synthesis of CeO_2 Nanoparticles and its Chemical Mechanical Polishing Performance
氧化铈纳米颗粒的合成及其化学机械抛光性能
5.
Study on the Performance of Polishing and Metal-ceramic Bonding of Nanoceramic;
牙科纳米陶瓷抛光性能及金瓷结合性能的研究
6.
Nano-machining experiment of LY12 aluminium alloy polishing with ice desk;
LY12铝合金的冰盘抛光纳米加工实验研究
7.
Polishing Property of α-Al_2O_3 Nanoflakes Prepared by Self-Burning Method
α-Al_2O_3纳米片的自燃烧法控制合成及其抛光性能
8.
Application of Float Polishing in Lapping of Metal Nanometer Surface
浮法抛光在金属纳米级超光滑表面加工中的应用
9.
Preparation of Photocatalytical Nanosized TiO_2 Powers by Low Temperature Liquid Phase Process and Characterization
光催化纳米TiO_2的低温液相制备及表征
10.
Synthesis of CeO_2 Nanoparticles via Alcohol-water Method and Its Polishing Performance on GaAs Wafer;
纳米CeO_2颗粒的醇水法制备及其对GaAs晶片的抛光性能研究
11.
Study on Chemical Mechanical Polishing of Semiconductor Silicon Wafer with Nano-SiO_2 Slurries and Its Application;
纳米SiO_2浆料中半导体硅片的化学机械抛光及其应用研究
12.
Research on Devices and Experiments for Nano-Particle Colloid Jet Machining
纳米胶体射流抛光试验装置研制及工艺试验研究
13.
Preparation of Silica Abrasives from Water Glass and Application in Silicon Wafer Polishing
水玻璃为原料制备纳米氧化硅磨料及应用于硅片抛光(英文)
14.
Preparation Nano-CeO_2 Particles and Its Polishing Performance for Si(100) and Si(111)
纳米CeO_2颗粒的制备及其对硅晶片(100)和(111)的抛光性能
15.
Preparation and Characterization of CeO_2@SiO_2 Composite Abrasive and Its Polishing Performance
包覆型纳米CeO_2@SiO_2复合磨料的制备、表征及其抛光性能
16.
Study on the Mechanism and Arts of Magnetorheological Finishing (MRF) by Nano-sized Diamond Abrasives
纳米金刚石磨料磁流变抛光材料去除机理与工艺研究
17.
Effects of Optical Limiting Properties of Suspended Carbon Nanotubes by Multi-pulse Laser
多脉冲激光对碳纳米管悬浮液光限幅特性影响
18.
double-die-turning finishing hydraulic press
双模具翻转抛光液压机