1.
Investigation on ECR Plasma Deposition and Dielectric Property of SiCOH Low-k Films;
SiCOH低k薄膜的ECR等离子体沉积与介电性能研究
2.
plasma activated chemical vapour deposition
等离子体化学气相沉积
3.
Study on ECR Hydrogen Plasma Treatment of SiC Surface;
SiC表面ECR氢等离子体处理研究
4.
Study on ECR Hydrogen Plasma Treatment of N-type 4H-SiC
N型4H-SiC ECR氢等离子体处理研究
5.
Spectroscopic Study on the Interactions between Pulsed-Laser-ablation-produced Plasma and ECR Plasma
脉冲激光烧蚀等离子体和ECR放电等离子体相互作用的光谱研究
6.
depositing plasma
沉积性等离子体（表面改性的主要工艺）
7.
Ultra-thin C-N-Si Protective Films Prepared by Plasma Enhanced Deposition;
等离子体增强沉积C-N-Si超薄保护膜
8.
Deposition of orthorhombic boron nitride films by plasma-enhanced pulsed laser deposition
等离子体增强脉冲激光沉积o-BN薄膜
9.
Latest Progress of Plasma Immersion Ion Implantation and Deposition and Its Applications
等离子体浸没式离子注入沉积技术及应用
10.
MW-ECR Plasma Enhanced Unbalance Magnetron Sputtering and Carbon Nitride Films Preparation;
微波-ECR等离子体增强非平衡磁控溅射技术及CN薄膜的制备研究
11.
Investigation on Low-κ SiCOH Films Prepared by ECR-CVD and the Influence of Fluorine Incorporation;
SiCOH低κ薄膜的ECR等离子体制备及F掺杂效应研究
12.
The Characteristic of ECR Plasma and Its Application in Deposition of GaN Thin Film;
ECR等离子体参数空间分布特性研究及制备GaN薄膜中的应用
13.
Prepared TiN Thin Films by LTP Enhanced Electronic Beam Evaporation;
低温等离子体增强电子束蒸发沉积TiN的研究
14.
Structural properties of nanocrystalline silicon films depositee by helicon wave enhanced chemical vapor deposition
螺旋波等离子体沉积纳米硅薄膜结构特性
15.
Diamond thin films grown up by microwave plasma CVD
微波等离子体化学气相沉积金刚石簿膜
16.
WORKING PRINCIPLE OF MICROWAVE PLASMA CVD SET UP
微波等离子体化学气相沉积装置的工作原理
17.
Study on Device of Magneto-active Plasma Enhanced Chemical Vapor Deposition;
磁激活等离子体增强化学气相沉积设备的研制
18.
Investigation of Plasma Chemistry in the Deposition of F-doped SiCOH Films;
氟掺杂SiCOH薄膜沉积的等离子体化学特性研究