1.
The Research of Mark Signal Detection and Alignment Technology Used in High-energy Projection Electron Beam Lithography System with Demagnification Imaging (PELDI);
高能电子束缩小投影曝光机标记信号检测及对准技术的研究
2.
electron beam projection exposure apparatus
电子束投影曝光装置
3.
reducing electron beam projection system
缩小式电子束投影系统
4.
The elementary exposure pattern of a variable rectangular electron beamexposure machine is a rectangle.
可变矩形电子束曝光机的基本曝光图形是矩形。
5.
reduction aligner
收缩式投影曝光装置
6.
variable shaped electron beam exposure system
可变电子束曝光装置
7.
cool beam low volatage electronic projective lamp
冷光束低压电子投影灯
8.
Research on Focusing-deflection System for Nanometer-scale Electron Beam Lithography Machine;
纳米级电子束曝光机聚焦偏转系统的研究
9.
E-beam Lithography Stage Controller Design Based on FPGA
基于FPGA的电子束曝光机工件台控制器设计
10.
Rearch of Mark-Detection and Registration in Scanning-Electron-Beam Lithographic System;
扫描电子束曝光机背散射电子检测与对准技术的研究
11.
The E-beam Lithograpy Control System Based on VC++6.0
基于VC++6.0的电子束曝光控制系统
12.
APPLICATION OF PHASE-LOVKED METHOD IN CONSTANT SPEED CONTROL OF STAGE OF EB EXPOSURE MACHINE
锁相技术在电子束曝光机工件台稳速控制中的应用
13.
The Research and Development of the Utility Program about Graphic Data Conversion for E-beam Lighography System;
可变矩形电子束曝光机图形数据转换软件的实用化研制
14.
microfilm exposed and developed
缩微胶片,已曝光和显影
15.
Finally the lighting was finished and we just needed to adjust the tone mapping, the exposure and aperture of the camera to complete the image.
最后灯光设置结束后我们仅仅需要调节贴图色调，和摄影机曝光度和光圈大小来完成这张图片。
16.
Study of Pattern Generator for Nanometer E-beam Lithography System;
纳米级电子束曝光系统用图形发生器技术研究
17.
Measurement System of Precision Stage for E-Beam Aligner
电子束曝光系统中精密工件台的测量系统
18.
Research on Microchannel Fabrication of PCR Chip by Electron Beam Lithography Based on Overlapped Scanning
电子束重复曝光加工PCR微通道的工艺研究