1.
Standard for-ray full view exposure technique of spherical tank
球形储罐射线全景曝光技术标准
2.
Hourglass-shaped X-ray compound refractive lens made by back-mask exposure technology
背面曝光技术制作沙漏状X射线组合折射透镜
3.
Application of Gamma Radiate of Full-screen Panoram in Large-scale Spherical Tank Group
γ射线全景曝光技术在大型球罐群检测中的应用
4.
The Key Technology and Research Status of Mask Projection Stereolithography
面曝光快速成形关键技术及研究现状
5.
Fundamentals and Lithographie Technology Based on Pulse Laser Exposing SU-8 Photoresist;
脉冲激光曝光SU-8胶的基础与光刻技术研究
6.
Study of Pattern Generator for Nanometer E-beam Lithography System;
纳米级电子束曝光系统用图形发生器技术研究
7.
Robustness Study of Motion Detection Based on Joint Transform Correlator Without Enough Illumination
欠曝光下光学联合变换相关器位移探测技术的稳健性研究
8.
"Other techniques include varying the camera speed, using multiple exposures, showing multiple images within a single frame, etc."
此外，还有改变摄影速度，多次曝光及叠化画面等技术。
9.
Allied with technology, globalisation increases competition and exposes inefficiency.
通过技术的发展，全球化提高了竞争也曝光了低效率。
10.
APPLICATION OF PHASE-LOVKED METHOD IN CONSTANT SPEED CONTROL OF STAGE OF EB EXPOSURE MACHINE
锁相技术在电子束曝光机工件台稳速控制中的应用
11.
The Research of Transfer Pattern Layer and Stamp Imprinting and Curing Process Based on UV-NIL;
紫外纳米压印关键技术—图形转移层与模压曝光工艺研究
12.
Rearch of Mark-Detection and Registration in Scanning-Electron-Beam Lithographic System;
扫描电子束曝光机背散射电子检测与对准技术的研究
13.
The Research of Mark Signal Detection and Alignment Technology Used in High-energy Projection Electron Beam Lithography System with Demagnification Imaging (PELDI);
高能电子束缩小投影曝光机标记信号检测及对准技术的研究
14.
Application of marked fractionated exposure technology in full-length radiography of lower limbs
MARK标记分次曝光法在下肢全长X线摄影技术中的应用价值
15.
Photography: The various techniques which use light to procucer a latent or permanent image on a light sensitive material, including projection and contact exposure methods.
摄影术:用光在感光物料上造成潜影或永久影像的各种技巧。它包括投射和接触曝光方法。
16.
Exposure,radiographic exposure
曝光,射线照相曝光
17.
In microelectronics, the process of removing material, on a chip, left exposed by the exposure and development of the photoresist.
在微电子技术中,通过曝光并显影光刻胶除去芯片上的物质露出剩余部分的工艺。
18.
double-exposed holographic interferometry
二次曝光全息干涉测量术