1.
Analysis and Solutions to Unsteady Gas Flow of CVD
CVD设备气流不稳定因素分析及解决方案
2.
Reserches of Equipment Design and Process Mechanics about CVD(CVI) Silica;
CVD/CVI氧化硅设备研制及工艺机理探索
3.
The application of reactive power compensator to DC-Arc plasma CVD diamond equipment
无功功率补偿技术在直流电弧CVD金刚石设备中的应用
4.
The Preparation of Cubic Boron Nitride Thin Films by ECR CVD System and Study of Their Properties;
ECR CVD制备立方氮化硼薄膜及性能研究
5.
The Fabrication of Continuous High Performance SiC Fiber by Chemical Vapor Deposition;
CVD法制备高性能SiC连续纤维技术
6.
Computer Control System of Producing Carbon Nanotubes with CVD;
CVD法制备纳米碳管的计算机控制系统
7.
The Study of A-Si-H Films Prepared by MWECR CVD;
MWECR CVD制备a-Si:H薄膜光稳定性研究
8.
Simulation of Growth Process of Titania Nanoparticles Synthesized by Flame CVD Process;
火焰CVD法制备TiO_2纳米颗粒的数值模拟
9.
The Preparation of Device-Quality Hydrogenated Amorphous Silicon Thin Films by Mwecr-Cvd Assisted by Hot-Wire;
热丝辅助MWECR-CVD制备器件级非晶硅薄膜
10.
Deposition Process Study of Device Quality a-Si:H Film by Method of MWECR CVD with High Deposition Rate;
MWECR CVD高速制备a-Si：H薄膜的工艺研究
11.
Synthesis and Characterization of Aligned Carbon Nanotubes Prepared by CVD;
CVD法制备定向纳米碳管及其表征
12.
Study on Growth and Optical Emission of a-SiN_x: H Films Prepared by ECR-CVD;
ECR-CVD制备a-SixN：H薄膜及其发光性能的研究
13.
Study of MWECR CVD Deposition Technique for a-Si:H and Properties of a-Si:H;
a-Si:H薄膜的MWECR CVD制备及特性研究
14.
Technical Study on Deposition of B-C Films by MWECR CVD Method;
MWECR CVD法制备B-C薄膜的工艺研究
15.
Development of Preparative Technique and Application of Chemical Vapor Deposition Diamond(Film)
CVD金刚石膜制备技术及应用进展
16.
Preparations and Characteration of single phosphorus-doped p-type ZnO nanowire
CVD法制备单根磷掺杂P型ZnO纳米线
17.
The Analysis of CVD Process for High Purity Titanium
CVD法制备高纯钛形核过程动力学分析
18.
Synthesis of multiwall carbon nanotubes by decomposition of methane over vanadium container catalysts
用含钒催化剂CVD法制备多壁纳米碳管