1.
An Investigation of Reactive Ion Etching for Through Silicon Via Packaging Technology
反应离子刻蚀在穿透硅通孔封装技术中的应用研究
2.
RIE of SiO_2 Nanoparticles and Its Application in Preparation of Silicon Nanopillar Array
二氧化硅纳米颗粒的反应离子刻蚀及其在硅纳米针尖制备中的应用(英文)
3.
Investigation on Technics and Property of Broadband Infrared Antireflective Sub-wavelength Structures Prepared by RIE on Ge Substrate
锗衬底上反应离子刻蚀制备宽波段红外增透结构的工艺及性能研究
4.
Tolerance of ion beam etching on multilayer dielectric thin film reflector for spectrum reshaping
多层介质膜光谱调制反射镜的反应离子束刻蚀误差容限
5.
Inductively coupled plasma reactive ion etching of InSb photovoltaic detector arrays
InSb阵列探测芯片的感应耦合等离子反应刻蚀研究
6.
plasma sputter combined etching
等离子溅射复合刻蚀
7.
APPLICATION OF ION BEAM MILLING TECHNIQUE TO JOSEPHSON DEVICE TECHNOLOGY
离子束刻蚀技术在约瑟夫逊器件工艺中的应用
8.
Investigation of Inductively Coupled Fluorocarbon Plasma and Etching of SiO_2;
碳氟感应耦合等离子体及其SiO_2介质刻蚀研究
9.
The Study of the Etching Process with RF Cold Plasma at Atmospheric-pressure;
常压射频冷等离子体在刻蚀工艺中的应用研究
10.
barrel reactor plasma etching
圆筒形反应期等离子腐蚀
11.
Behaviour of Ar~+ Ion in Reactive Ion Etching of Ⅲ-Ⅴ Compound
氩离子在反应离子腐蚀Ⅲ-Ⅴ族材料中的作用
12.
Acceptable Error of Etching Depth in Ion Beam Etching Microlens
离子束蚀刻微透镜中蚀刻深度允许误差的研究
13.
Electrochemical corrosion behavior of reactive plasma-sprayed TiN coatings
反应等离子喷涂TiN涂层电化学腐蚀行为
14.
The Study of Nanometer Effect Induced by Ar~(q+) Ions Impact on HOPG Surface;
Ar~（q+）离子与HOPG表面相互作用的纳米刻蚀效应研究
15.
Study of Inductively Coupled Plasma Etch of InP and Fabrication of 14xxnm Pump Laser Diodes;
感应耦合等离子体刻蚀InP研究与14xxnm泵浦激光器制作
16.
Generic specification of ion beam etching system
GB/T15861-1995离子束蚀刻机通用技术条件
17.
NUMERICAL STUDIES ON ETCH PROFILES IN HIGH-DENSITY PLASMA;
高密度等离子体刻蚀轮廓的数值研究
18.
Investigation of Etching SiCOH Films by Dual-Frequency Capacitively Coupled Plasma
SiCOH薄膜的双频等离子体刻蚀研究